Zobrazeno 1 - 10
of 61
pro vyhledávání: '"Stefan Landis"'
Publikováno v:
Soft matter. 16(35)
Building 3D ordered nanostructures by copolymer deposition on a substrate implies a full control beyond the thin film regime. We have used here block copolymers (BCPs) forming bulk lamellar phases to form thick, i.e. much thicker than the lamellar pe
Publikováno v:
Soft Matter
Soft Matter, Royal Society of Chemistry, In press, 16, pp.8179-8186. ⟨10.1039/D0SM00603C⟩
Soft Matter, In press, 16, pp.8179-8186. ⟨10.1039/D0SM00603C⟩
Soft Matter, Royal Society of Chemistry, In press, 16, pp.8179-8186. ⟨10.1039/D0SM00603C⟩
Soft Matter, In press, 16, pp.8179-8186. ⟨10.1039/D0SM00603C⟩
International audience; Building 3D ordered nanostructures by copolymer deposition on a substrate implies a full control beyond the thin film regime. We have used here block copolymers (BCPs) forming bulk lamellar phases to form thick, i.e. much thic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::02eabd3ae401eeed0ac252051a896e66
https://hal-cea.archives-ouvertes.fr/cea-02915378
https://hal-cea.archives-ouvertes.fr/cea-02915378
Autor:
Pierre Brianceau, Maria Laure, Martin Eibelhuber, Markus Wimplinger, Mustapha Chouiki, May Michael, Jonas Khan, Christine Thanner, Stefan Landis, Olivier Pollet, Hubert Teyssedre, Jerome Hazart, Cyrille Laviron, Laurent Pain, Sandra Bos
Publikováno v:
Advanced Optical Technologies. 6:277-292
To evaluate the maturity of the wafer-scale NanoImprint lithography (NIL) process, laboratory of electronic and communication technology (LETI) and EV Group (EVG) launched the Imprint Nanopatterning Solution Platform for Industrial Assessment program
Autor:
Stijn Willem Herman Karel Steenbrink, Guido De Boer, Stefan Landis, Jonathan Pradelles, Isabelle Servin, Guido Rademaker, Pieter Brandt, Laurent Pain, Marco Jan-Jaco Wieland, Remco Jager
Publikováno v:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019.
Mapper has installed its first product, the FLX–1200, at CEA-Leti in Grenoble (France). This is a maskless lithography system, based on massively parallel electron-beam writing with high-speed optical data transport for switching the electron beams
Autor:
Marco Wieland, Stijn Steenbrink, Erwin Slot, Jerry J. Peijster, Remco Jager, Michel Dansberg, Pieter Brandt, Guido De Boer, Isabelle Servin, Guido Rademaker, Stefan Landis, Jonathan Pradelles, Yoann Blancquaert, Laurent Pain
Publikováno v:
34th European Mask and Lithography Conference.
Autor:
Nivea Figueiro, Matthew Sendelbach, Thibault Labbaye, Stephane Rey, Yoann Blancquaert, Barak Bringoltz, Shay Wolfling, Guido Rademaker, Lucie Mourier, Ronny Haupt, Daniel Kandel, Francisco Sanchez, Stefan Landis, Michael Shifrin, Jonathan Pradelles, Laurent Pain, Avron Ger, Roy Koret
Publikováno v:
34th European Mask and Lithography Conference.
Multiple electron beam direct write lithography is an emerging technology promising to address new markets, such as truly unique chips for security applications. The tool under consideration, the Mapper FLX-1200, exposes long 2.2 μm-wide zones calle
Autor:
Dhara Dave, Guido Rademaker, Anna Golotsvan, Erwin Slot, Ronny Haupt, T. Shapoval, Stefan Landis, Anat Marchelli, Stephane Rey, Tal Itzkovich, Laurent Pain, Guido De Boer, Jonathan Pradelles, Marco Jan-Jaco Wieland
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
One of the metrology challenges for massively parallel electron beams is to verify that all the beams that are used perform within specification. The Mapper FLX-1200 platform exposes fields horizontally segmented in 2.2 μm-wide stripes. This yields
Autor:
Stefan Landis, Stijn Willem Herman Karel Steenbrink, Guido De Boer, Pieter Brandt, Guido Rademaker, Michel Pieter Dansberg, Jerry Johannes Martinus Peijster, Laurent Pain, Marco Jan-Jaco Wieland, Remco Jager, Jonathan Pradelles, Isabelle Servin, Yoann Blancquaert, Erwin Slot
Publikováno v:
Novel Patterning Technologies 2018.
Mapper has installed its first product, the FLX–1200, at CEA-Leti in Grenoble (France). This is a maskless lithography system, based on massively parallel electron-beam writing with high-speed optical data transport for switching the electron beams
Process development of a maskless N40 via level for security application with multi-beam lithography
Autor:
Philippe Essomba, Gerard ten Berge, Marco Jan-Jaco Wieland, Philippe Brun, Jonathan Pradelles, Stefan Landis, Yoann Blancquaert, Patricia Pimenta-Barros, Isabelle Servin, Arthur Bernadac, Allan Germain
Publikováno v:
Novel Patterning Technologies 2018.
The maskless electron beam lithography system, based on massively parallel electron-beam writing strategy has the ability for low-cost production of truly unique individual chips in volume manufacturing, compatible with optical systems. Mapper Lithog
New 3D structuring process for non-integrated circuit related technologies (Conference Presentation)
Publikováno v:
Emerging Patterning Technologies.
Fabrication processes that microelectronic developed for Integrated circuit (IC) technologies for decades, do not meet the new emerging structuration’s requirements, in particular non-IC related technologies one, such as MEMS/NEMS, Micro-Fluidics,