Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Stefan Helbig"'
Autor:
Raimo Füllsack‐Köditz, Stefan Helbig
Publikováno v:
Bauphysik. 34:121-129
Ein moglicher Weg um hohe pauschale Warmebruckenzuschlage im EnEV-Nachweis zu vermeiden, ist die Berucksichtigung der Warmeverluste uber Bauteilanschlusse mit dem “detaillierten Verfahren“ durch den langenbezogenen Warmedurchgangskoeffizienten (y
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5e7758e12ed19f2353b294f20981498e
https://doi.org/10.1002/bapi.201200015
https://doi.org/10.1002/bapi.201200015
Publikováno v:
SPIE Proceedings.
In recent years, photomask resist strip and cleaning technology development was substantially driven by the industry's need to prevent surface haze formation through the elimination of sulfuric acid from these processes. As a result, ozone water was
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9355181c61ec4cfa0eda5a0c12f92503
https://doi.org/10.1117/12.824254
https://doi.org/10.1117/12.824254
Publikováno v:
Photomask Technology 2008.
The use of MegaSonic energy is widely accepted in photomask cleaning. For the advanced technology nodes, beyond 65nm, the problem of damaged sub resolution assist features (SRAF) becomes highly prevalent. Such feature damages are often related to the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::694ebe3690ba6499f09bb77a763ed253
https://doi.org/10.1117/12.801408
https://doi.org/10.1117/12.801408
Publikováno v:
SPIE Proceedings.
Today, haze and crystal growth on the reticle surface are still a primary concern of the microlithography industry. The crystals limit the reticle usage as they result in printable defects on the wafers. Numerous studies have been presented so far. T
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e4c3ddf26c4827ed93d711f20953fb32
https://doi.org/10.1117/12.632055
https://doi.org/10.1117/12.632055
Publikováno v:
SPIE Proceedings.
Contaminants and residues on the mask surface are still a concern to the Microlithography industry as they influence the reticle printing properties. It is conceivable that this effect will worsen as the industry moves toward smaller nodes for the ne
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0800be7066e94a028c3af5a58b98ffd2
https://doi.org/10.1117/12.632053
https://doi.org/10.1117/12.632053
Publikováno v:
SPIE Proceedings.
Today, the industry is suffering from the consequences of residue and contaminants on the mask surface as they significantly affect the printing quality of the reticle. Thus a good control of the mask cleanliness via its optical properties is becomin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d37b88547d3c8a9a83036f8de177be7a
https://doi.org/10.1117/12.617119
https://doi.org/10.1117/12.617119