Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Stefan Doebereiner"'
Autor:
Stefan Doebereiner, Anthony Grimshaw, Thomas Schatz, Andrew C. Hourd, Gordon Hughes, Parkson W. Chen, Hans-Jürgen Brück, Paul J. M. van Adrichem, Shiuh-Bin Chen, Herman Boerland, Alexander Petrashenko, Gerd Scheuring, Thomas Struck, Sigrid Lehnigk, Frank Hillmann
Publikováno v:
19th European Conference on Mask Technology for Integrated Circuits and Microcomponents.
Besides the metrology performance of a CD measurement tool, its close integration into a manufacturing environment becomes more and more important. This is extremely driven by the ever increasing complexity of masks and their tightening specification
Autor:
Parkson W. Chen, Hans-Juergen Brueck, Christian Gittinger, Stefan Doebereiner, Gerd Scheuring, Anthony Grimshaw, Thomas Schaetz, Vicky Philipsen, Kai Peter, Shiuh-Bin Chen, Andrew C. Hourd, Hans Hartmann, Frank Hillmann, Volodymyr Ordynskyy, Karl Sommer, Rik Jonckheere
Publikováno v:
SPIE Proceedings.
The new MueTec , an advanced CD metrology and review station operating at DUV (248nm) wavelength, has been extensively characterised in a reticle production environment. Performance data including resolution, measurement repeatability and throughput
Publikováno v:
21st Annual BACUS Symposium on Photomask Technology.
TO enable lithography at low k1 factors, OPC on photo masks is a method of strong and growing importance. But CD metrology of OPC features is suffering form several drawbacks: (1) OPC structures often do not have two parallel edges, which are require