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pro vyhledávání: '"Stanley Zirinsky"'
Publikováno v:
Journal of Electronic Materials. 4:429-444
A chemical vapor deposition process for depositing dielectric films of aluminum oxynitride is described. AlCl3, CO2 and NH3 were employed as the reactive gases in a nitrogen carrier. Films were grown from the mixed gases at 770 and 900°C in a resist
Autor:
Stanley Zirinsky
Publikováno v:
Acta Metallurgica. 4:164-171
The temperature dependence of the dynamic elastic constants (Moduli of Compliance, S11, S12 and S44) of body-centered cubic Au-Cd alloys that undergo diffusionless phase change, has been determined as a function of composition variation within the be