Zobrazeno 1 - 10
of 24
pro vyhledávání: '"Stanley Huang"'
Autor:
Li Wang, Timothy Chan, Juan Dong, Hieu Ta, Keman Zhang, Tyler Alban, Abhishek Chakraborty, Stefanie Avril, Andrelie Branicky, Ajay Zalavadia, Amin Zakeri, Haoxin Zhao, Ivan Juric, Hanna Husich, Prerana Parthasarathy, Amit Rupani, Judy Drazba, Stanley Huang
Publikováno v:
Journal for ImmunoTherapy of Cancer, Vol 11, Iss Suppl 1 (2023)
Externí odkaz:
https://doaj.org/article/d27af54e032c42259de010b8ee54dd2d
Autor:
Shih-Chin Cheng, Buyun Dang, Jia Zhang, Qingxiang Gao, Qiumei Zhong, Lishan Zhang, Yanhui Zhu, Junqiao Liu, Yujia Niu, Nengming Xiao, Wen-Hsien Liu, Kairui Mao, Shu-hai Lin, Jialiang Huang, Stanley Huang, Ping-Chih Ho
T helper type 2 (Th2) cytokine-activated M2 macrophages play a major role in inflammation resolution and wound healing. Myriads of studies have demonstrated the anti-inflammatory feature of M2 macrophages. In the present study, we report that IL-4-pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ffe842762677c8d99bd991f914912e36
https://doi.org/10.21203/rs.3.rs-1322480/v2
https://doi.org/10.21203/rs.3.rs-1322480/v2
Autor:
Shih-Chin Cheng, Buyun Dang, Jia Zhang, Qingxiang Gao, Qiumei Zhong, Lishan Zhang, Yanhui Zhu, Junqiao Liu, Yujia Niu, Nengming Xiao, Wen-Hsien Liu, Kairui Mao, Shu-hai Lin, Jialiang Huang, Stanley Huang, Ping-Chih Ho
Trained immunity, or innate immune memory, is vital in inducing heterologous protection against infection. Type 2 cytokines such as IL-4 and IL-13 induce M2 macrophage differentiation, characterized by anti-inflammatory phenotype permitting inflammat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd59216f669dc865c73043f5937ec79b
https://doi.org/10.21203/rs.3.rs-1322480/v1
https://doi.org/10.21203/rs.3.rs-1322480/v1
Publikováno v:
SSRN Electronic Journal.
Autor:
Shyama Patel, Harmain Rafi, Stanley Huang, Krystyna Solarana, Jonathan A. N. Fisher, Meijun Ye, Cristin G. Welle, Matthew R. Myers, Marjan Nabili, Victor Krauthamer, Yunbo Liu
Publikováno v:
Scientific Reports, Vol 9, Iss 1, Pp 1-17 (2019)
Scientific Reports
Scientific Reports
Exposure of the brain to high-intensity stress waves creates the potential for long-term functional deficits not related to thermal or cavitational damage. Possible sources of such exposure include overpressure from blast explosions or high-intensity
Autor:
Meijun Ye, Jonathan A. N. Fisher, Cristin G. Welle, Stanley Huang, Todd P. Coleman, Marjan Nabili, Yun-Soung Kim, Victor Krauthamer, Matthew R. Myers, Rui Ma
Publikováno v:
IEEE Trans Biomed Eng
Objective: We aim to demonstrate the in vivo capability of a wearable sensor technology to detect localized perturbations of sensory-evoked brain activity. Methods: Cortical somatosensory evoked potentials (SSEPs) were recorded in mice via wearable,
Publikováno v:
Journal of Chemical & Engineering Data; 11/11/2021, Vol. 66 Issue 11, p4000-4017, 18p
Autor:
Hyounguk Jang, Meijun Ye, Stanley Huang, Jonathan A. N. Fisher, Cristin G. Welle, Daniel X. Hammer, Lin Wang
Traumatic brain injury (TBI) is a leading cause of mortality and disability worldwide. A challenge for diagnosing and assessing the severity of TBI, however, is that quantitative biomarkers are lacking. We explored potential functional indicators for
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4601f45d822c9b9a97a5a775fe79279c
https://doi.org/10.1101/183129
https://doi.org/10.1101/183129
Publikováno v:
Design and Quality for Biomedical Technologies X.
Near-infrared spectroscopy (NIRS) has emerged as a low-cost, portable approach for rapid, point-of-care detection of hematomas caused by traumatic brain injury. As a new technology, there is a need to develop standardized test methods for objective,
Autor:
Stanley Huang, Matt Yeh, Jeffrey M. Lauerhaas, Jeffery W. Butterbaugh, David Yang, Anthony S. Ratkovich, S.M. Jang, Chien-Hao Chen, Bill Yu
Publikováno v:
Solid State Phenomena. 195:46-49
Selective etching of silicon nitride films has been an important process step in integrated circuit manufacturing for many years [1-. In the past, this process has been mainly used to remove the silicon nitride mask which protects the transistor acti