Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Stanley A. Ficner"'
Publikováno v:
SPIE Proceedings.
In our previous publication we reported an improved process for isolation of novolak resins form phenol-formaldehyde condensation mixtures. The process results in resins having low polydispersity and slow photospeed. Novolak resins were prepared by t
Autor:
Shuji Ding, Dinesh N. Khanna, Ralph R. Dammel, Munirathna Padmanaban, Stanley A. Ficner, Wen-Bing Kang
Publikováno v:
SPIE Proceedings.
The present paper discusses theory, design and properties of bottom anti-reflective coatings (BARCs) for deep UV and i- line applications. All BARCs are interference devices, and as such their optical constants are optimal only for certain combinatio
Autor:
M. D. Rahman, Ralph R. Dammel, Michelle M. Cook, Stanley A. Ficner, Munirathna Padmanaban, Joseph E. Oberlander, Dana L. Durham, Axel Klauck-Jacobs
Publikováno v:
SPIE Proceedings.
Publikováno v:
SPIE Proceedings.
In this paper we evaluate the photoactive compound (PAC) performance in a thick film photoresist. In an effort to report the performance of a thick film photoresist and the correlation to PAC structure, we have studied several formulations containing
Autor:
Stanley A. Ficner, Kathryn H. Jensen
Publikováno v:
SPIE Proceedings.
The development of a dyed thick film photoresist for visualization purposes is described. The need for a visualization dye for residual resist (the coil layers) is a possible requirement for the thin film head fabrication technology. Because of the h
Publikováno v:
Advances in Resist Technology and Processing XIV.
Prism coupling is applied to thick film DNQ/novolak photoresist materials in the 4.6 to 24 micrometer range. Refractive indices are obtained as a function of softbake temperature and softbake time for exposed and unexposed resists. The results for AZ
Publikováno v:
SPIE Proceedings.
Progress in high resolution resists has contributed substantially to the continuing success of i- line lithography. We report here on a resist development as well as complete lithographic characterization of AZR 7800 photoresist, a new commercial hig
Autor:
Ping-Hung Lu, Ralph R. Dammel, Elaine Kokinda, Stanley A. Ficner, James Hermanowski, Yvette M. Perez
Publikováno v:
SPIE Proceedings.
This paper describes the development of two advanced new thick film photoresists. Statistical experimental design was used to investigate the performance characteristics of a select group of novolak resins and diazonaphthoquinone photoactive compound
Synthesis and lithographic performance of highly branched polymers from hydroxyphenylmethylcarbinols
Autor:
James R. Sounik, Ping-Hung Lu, Ralph R. Dammel, Stanley A. Ficner, Elaine Kokinda, Richard Vicari
Publikováno v:
SPIE Proceedings.
A new synthesis pathway for 4- and 2-hydroxymethylcarbinol (4- and 2-HPMC) has made a new class of highly branched polymers readily available. The polymers, which are isomers of polyhydroxystyrene, show unexpected dissolution behavior in aqueous base
Autor:
Ping-Hung Lu, Walter Spiess, Anthony Canize, Stanley A. Ficner, Yvette M. Perez, Ralph R. Dammel
Publikováno v:
SPIE Proceedings.
The use of i-line photolithography is finding increased importance in generating today's advanced semiconductor devices. The requirements in this area have led to the recent development of wide field i-line steppers whose large field sizes permit hig