Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Stan Drazkiewicz"'
Publikováno v:
SPIE Proceedings.
As optical lithography approaches the 0.25 micrometers performance level, overlay performance approaches 75 nanometers (nm). This in turn requires alignment systems to work to tighter budgets. This paper presents the theory of operation behind the AX
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::befbc1b6b5d9c6525180d1504ca52cce
https://doi.org/10.1117/12.240980
https://doi.org/10.1117/12.240980
Publikováno v:
SPIE Proceedings.
The MICRASCAN-II (MS-II) is a 0.50 NA DUV broadband illumination (245 nm to 252 nm) step-and-scan exposure system manufactured by Silicon Valley Group Lithography Systems, Inc. (SVGL) of Wilton, Connecticut. The system is designed to provide 350 nm r
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2a209e3e327ce8949d0cbc3e8cb42b05
https://doi.org/10.1117/12.175489
https://doi.org/10.1117/12.175489