Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Stacey Stone"'
Autor:
David W. Kays, Henry Chang, Dina Fuoad, Charles J. Smithers, Keith Thatch, Stacey Stone, Ory Newman
Publikováno v:
Section on Neonatal-Perinatal Medicine Program.
Purpose: The epidemiology of neonatal hyperbilirubinemia has been previously described and many associated factors show significant positive relationships. Congenital diaphragmatic hernia is an uncommon condition of approximately 1-3000 live births.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::baaf35d1790fb5945ab226ea75f89684
https://doi.org/10.1542/peds.147.3_meetingabstract.705
https://doi.org/10.1542/peds.147.3_meetingabstract.705
Autor:
Jeff Blackwood, Sung Jae Lee, Stacey Stone, Mark Williamson, Michael Schmidt, Woo Jun Kwon, Sang Hoon Lee
Publikováno v:
International Symposium for Testing and Failure Analysis.
The cross-sectional and planar analysis of current generation 3D device structures can be analyzed using a single Focused Ion Beam (FIB) mill. This is achieved using a diagonal milling technique that exposes a multilayer planar surface as well as the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e1fa4835deffc43a724cc949fb30d37
https://doi.org/10.31399/asm.cp.istfa2018p0224
https://doi.org/10.31399/asm.cp.istfa2018p0224
Autor:
Vinh Van Ngo, Frank Altmann, Ralf Lehmann, Stacey Stone, Jan Schischka, Laurens F. Tz. Kwakman
Publikováno v:
International Symposium for Testing and Failure Analysis.
A novel analytical method applying combined electron beam induced current (EBIC) imaging based on scanning electron microscopy (SEM) and focused ion beam (FIB) cross sectioning in a SEM/FIB dualbeam system is presented. The method is demonstrated in
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c98c889b13c586bd299384b1907d7dba
https://doi.org/10.31399/asm.cp.istfa2010p0151
https://doi.org/10.31399/asm.cp.istfa2010p0151
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XVIII.
A new focused ion beam and electron beam based approach to metrology is used for accelerated process development of Chemical Mechanical Planarization (CMP) related back end processes. The technology is studied with the intention of employing it in ra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1468e5dc6ca73037591aa7adc89322b4
https://doi.org/10.1117/12.538051
https://doi.org/10.1117/12.538051
Autor:
Stacey Stone, David M. Berman, Carine Stromquist, Rajan Wadhawan, JoEllen Harris, Tracy L. Hullett, Valarie J. Snyder, Lori Sammel
Publikováno v:
American Journal of Infection Control. 40:e145-e146
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d8d49f317ec014ae34bb5c6025896b2d
https://doi.org/10.1016/j.ajic.2012.04.257
https://doi.org/10.1016/j.ajic.2012.04.257
Autor:
Davis, Stacey Stone
Publikováno v:
Mailbox: The Primary Edition; Feb/Mar99, Vol. 21 Issue 1, p52, 5p, 5 Color Photographs, 2 Charts