Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features

Autor: Dallorto, Stefano, Staaks, Daniel, Schwartzberg, Adam, Yang, XiaoMin, Lee, Kim Y, Rangelow, Ivo W, Cabrini, Stefano, Olynick, Deirdre L

Publikováno v: Dallorto, S; Staaks, D; Schwartzberg, A; Yang, X; Lee, KY; Rangelow, IW; et al.(2018). Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features. Nanotechnology, 29(40). doi: 10.1088/1361-6528/aad393. Lawrence Berkeley National Laboratory: Retrieved from: http://www.escholarship.org/uc/item/2mq5j0t3
Nanotechnology, vol 29, iss 40

© 2018 IOP Publishing Ltd. The next generation of hard disk drive technology for data storage densities beyond 5 Tb/in2will require single-bit patterning of features with sub-10 nm dimensions by nanoimprint lithography. To address this challenge mas

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http://www.escholarship.org/uc/item/2mq5j0t3

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Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features.

Autor: Dallorto S; Molecular Foundry, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, United States of America. Ilmenau University of Technology, Department of Micro-and Nanoel. Syst., D-98684, Germany. Oxford Instruments, 300 Baker Avenue, Suite 150, Concord, MA 01742, United States of America., Staaks D, Schwartzberg A, Yang X, Lee KY, Rangelow IW, Cabrini S, Olynick DL

Publikováno v: Nanotechnology [Nanotechnology] 2018 Oct 05; Vol. 29 (40), pp. 405302. Date of Electronic Publication: 2018 Jul 16.