Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Stéfanie Meunier"'
Autor:
Jerome Belledent, Marco Jan-Jaco Wieland, Stéfanie Meunier, B. Icard, Céline Tranquillin, Aurélien Fay, Pieter Brandt, Thiago Figueiro, Matthieu Milléquant, Sébastien Bayle
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 13:031306
For proximity effect correction in 5 keV e-beam lithography, three elementary building blocks exist: dose modulation, geometry (size) modulation, and background dose addition. Combinations of these three methods are quantitatively compared in terms o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7fab861bf8ffdb9425d8d23c8ed95271
https://doi.org/10.1117/1.jmm.13.3.031306
https://doi.org/10.1117/1.jmm.13.3.031306
Autor:
Brandt, Pieter, Belledent, Jérôme, Tranquillin, Céline, Figueiro, Thiago, Meunier, Stéfanie, Bayle, Sébastien, Fay, Aurélien, Milléquant, Matthieu, Icard, Beatrice, Wieland, Marco
Publikováno v:
Journal of Micro/Nanolithography, MEMS & MOEMS; Jul-Sep2014, Vol. 13 Issue 3, p1-11, 11p