Zobrazeno 1 - 10 of 55 pro vyhledávání: '"Spee, C.I.M.A."'
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Akademický článek
In-situ monitoring for CVD processes
Autor: Hopfe, V. *, Sheel, D.W., Spee, C.I.M.A., Tell, R., Martin, P., Beil, A., Pemble, M., Weiss, R., Vogt, U., Graehlert, W.
Publikováno v: In Thin Solid Films 2003 442(1):60-65
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2
High-speed spatial atomic-layer deposition of aluminum oxide layers for solar cell passivation
Autor: Poodt, P.W.G., Lankhorst, A.M., Roozeboom, F., Spee, C.I.M.A., Maas, D., Vermeer, A.
Publikováno v: Advanced Materials, 32, 22, 3564-3567
In this Communication we show that with spatially separated ALD of Al2O3 growth rates of 1.2 nm s-1 can be achievd, showing excellent surface passivation (surface recombination velocities of
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3
Development of atmospheric pressure CVD processes for highquality transparent conductive oxides
Autor: Graaf, A. de, Deelen, J. van, Poodt, P.W.G., Mol, A.M.B. van, Spee, C.I.M.A., Grob, F., Kuypers, A.
Publikováno v: Inorganic and Nanostructured Photovoltaics-Symposium B at the E-MRS 2009 Spring Meeting, 7 June 2009 through 12 June 2009, Strasbourg. Conference code: 81832, 1, 2, 41-48
For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. It is sho
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4
Plasma enhanced chemical vapor deposition of ZnO : AI Iayers for thin film photovoltaics : control on the film growth
Autor: Creatore, M., Volintiru, I., Spee, C.I.M.A., Sanden, van de, M.C.M.
Publikováno v: Proceedings of the 11th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2008), September 15-19, 2008, Garmisch-Partenkirchen, Germany (Abstracts), 16-16
STARTPAGE=16;ENDPAGE=16;TITLE=Proceedings of the 11th International Conference on Plasma Surface Engineering : Conference and Exhibition (PSE 2008), September 15-19, 2008, Garmisch-Partenkirchen, Germany (Abstracts)
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https://research.tue.nl/nl/publications/d795717b-9721-4e26-9e9a-883826595596
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5
Development of APCVD process for high quality TCO
Autor: Deelen, J. van, Mol, A.M.B. van, Poodt, P.W.G., Grob, F., Spee, C.I.M.A.
Publikováno v: 2009 34th IEEE Photovoltaic Specialists Conference, PVSC 2009, 7 June 2009 through 12 June 2009, Philadelphia, PA, USA. reference code: 79913, 271-275
For the past decade TNO has been involved in the research and development of atmospheric pressure CVD (APCVD) and plasma enhanced CVD (PECVD) processes for deposition of transparent conductive oxides (TCO), such as tin oxide and zinc oxide. The use o
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::c17d95599ae1d2d05bfdb2bc077836b6
http://resolver.tudelft.nl/uuid:834dafb6-8bb1-4890-b9d8-0a72528bb3c8
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7
Seebeck measurements as a powerful technique to characterize TCO materials
Autor: van Helvoort, W.H., Spee, C.I.M.A., Volintiru, I., Sanden, van de, M.C.M., Kuypers, A.D.
Publikováno v: Proceedings of the 1st International Symposium on Transparent Conductive Oxides, 23-25 October 2006, Heraklion, Crete, Greece, 204
ENDPAGE=204;TITLE=Proceedings of the 1st International Symposium on Transparent Conductive Oxides, 23-25 October 2006, Heraklion, Crete, Greece
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https://research.tue.nl/nl/publications/967b3811-a93c-4112-935e-537fff3ca17a
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10
Kinetic study of the chemical vapor deposition of tin oxidereactor design, 'Coatings on Glass 1998'
Autor: Mol, van, A.M.B., Alcott, G.R., Croon, de, M.H.J.M., Spee, C.I.M.A., Schouten, J.C., Pulker, H., Schmidt, H., Aegerter, M.A.
Publikováno v: Selected papers from the 2nd International Conference on Coatings on Glass (ICCG) : Convention Center, Saarbrücken, Germany, September 6-10, 1998 ; [high-performance coatings for transparent systems in large-area and/or high-volume applications], 178-180
STARTPAGE=178;ENDPAGE=180;TITLE=Selected papers from the 2nd International Conference on Coatings on Glass (ICCG) : Convention Center, Saarbrücken, Germany, September 6-10, 1998 ; [high-performance coatings for transparent systems in large-area and/or high-volume applications]
Chem. Vapor Deposition is the result of a complicated interplay between gas phase chem., surface chem., and fluid dynamics of the reactor system. To improve in-line process control of an industrial deposition process, knowledge of all three phenomena
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https://research.tue.nl/nl/publications/e05b26f6-165c-4e5a-b505-46bed2f6cdf3
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