Zobrazeno 1 - 10
of 17
pro vyhledávání: '"Souvik Chakrabarty"'
Publikováno v:
Nanoscale. 8:1338-1343
The solubility behavior of Hf and Zr based hybrid nanoparticles with different surface ligands in different concentrations of photoacid generator as potential EUV photoresists was investigated in detail. The nanoparticles regardless of core or ligand
Publikováno v:
Chemistry of Materials. 27:5027-5031
Hf-based hybrid photoresist materials with three different organic ligands were prepared by a sol–gel-based method, and their patterning mechanism was investigated in detail. All hybrid nanoparticle resists are patternable using UV exposure. Their
Autor:
Raj R. Rao, Xiaomei Zeng, Kenneth J. Wynne, Dennis E. Ohman, Allison King, Souvik Chakrabarty, Lynn F. Wood, Sheena Abraham, Wei Zhang
Publikováno v:
Biomacromolecules
The alkyl chain length of quaternary ammonium/PEG copolyoxetanes has been varied to discern effects on solution antimicrobial efficacy, hemolytic activity and cytotoxicity. Monomers 3-((4-bromobutoxy)methyl)-3-methyloxetane (BBOx) and 3-((2-(2-methox
Publikováno v:
Journal of Photopolymer Science and Technology. 27:663-666
The authors gratefully acknowledgeSEMATECH for funding, as well as the CornellNanoscale Science and Technology Facility(CNF), Cornell Center of Materials Research(CCMR), the Nanobiotechnology Center (NBTC)and the KAUST-Cornell Center of Energy andSus
Publikováno v:
Macromolecules. 46:2984-2996
A series of hybrid elastomers were prepared by a combination of (1) condensation cured, −Si(OC2H5)3 end-capped, poly(3-trifluoroethoxymethyl-3-methyloxetane), “3F”, and a siliceous domain “builder”, bis(triethoxysilyl)ethane, and (2) a line
Publikováno v:
Macromolecules. 45:7900-7913
PDMS-3F-1.1-PDMS and PDMS-3F-4.5-PDMS triblock hybrid elastomers are investigated, wherein (1) 3F-1.1 and 3F-4.5 are poly(3-methyl-3-trifluoroethoxymethyl)-1,3-propylene oxide with Mn = 1.1 or 4.5 kDa, (2) segments are linked by urethane/urea forming
Publikováno v:
Macromolecular Chemistry and Physics. 213:1225-1238
Laboratory prepared and commercial poly(2-2,2,2-trifluoroethoxy-2-methyl)oxetane, P[3FOx] and poly(2-2,2,2-pentafluoropropoxy-2-methyl)oxetane, P[5FOx] polyols contain varying amounts of cyclics and low molar mass (LMW) constituents as byproducts of
Autor:
Souvik Chakrabarty, Kenneth J. Wynne, Yoshiki Chujo, Xiaojuan Zhang, Vamsi K. Yadavalli, Junpei Miyake, Puja Bharti
Publikováno v:
Polymer. 51:5756-5763
A processing method using high speed mixing was developed for the generation of nanocomposites comprised of α,ω-dihydroxy-polydimethylsiloxane (PDMS) and untreated fumed silica nanoparticles (U-FSN). Conventional condensation cure with poly(diethox
Publikováno v:
SPIE Proceedings.
Previous investigations on the patterning mechanism of nanoparticle photoresists provided insight into ligand displacement exerting a controlling influence on dissolution behavior of nanoparticles in organic developers. Nanoparticle core-ligand inter
Autor:
Christine Y. Ouyang, Souvik Chakrabarty, Markos Trikeriotis, Emmanuel P. Giannelis, Marie Krysak, Kyoungyong Cho, Christopher K. Ober
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IV.
DUV, EUV and e-beam patterning of hybrid nanoparticle photoresists have been reported previously by Ober and coworkers. The present work explores the underlying mechanism that is responsible for the dual tone patterning capability of these photoresis