Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Sophie Peng"'
Autor:
John Lin, Kaustuve Bhattacharyya, Jon Wu, Nikki Chang, Cathy Wang, Jacky Huang, Sophie Peng, Spencer Lin, Chih-Ming Ke, Y. C. Ku, Evert Mos, K. H. Chen, Albert Li, Steffen Meyer, W. T. Yang, Maurits van der Schaar, Roy Chu, Mir Shahrjerdy
Publikováno v:
SPIE Proceedings.
In keeping up with the tightening overall budget in lithography, metrology requirements have reached a deep subnanometer level [1]. This drives the need for clean metrology (resolution and precision). Results have been published of a thorough investi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::902cd7fa6903331a4f3063162b7902e3
https://doi.org/10.1117/12.879218
https://doi.org/10.1117/12.879218
Autor:
Omer Adam, R. Goossens, Wen-Chuan Wang, Andreas Fuchs, Mir Shahrjerdy, Karel van der Mast, Sophia Wang, Vivien Wang, Y. Cao, T. S. Gao, Jon Wu, Tsung-Chih Chien, X. Xie, W. T. Yang, Sophie Peng, R. C. Peng, H. H. Liu, Noelle Wright, Kaustuve Bhattacharyya, Szu-Yuan Lin, W. Lin, Jacky Huang, Simon Hsieh, Chih-Ming Ke, K. Lin, Maurits van der Schaar, Victor Shih, W. Shao, Chau Hui Wang, Yi-Yin Chen, John Lin, H. J. Lee, Miranda Un
Publikováno v:
2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
In this work, we propose a new technique for comprehensive scanner matching to fundamentally improve scanner productivity in a Giga fab. The proposal covers matching solutions for both CD and overlay fingerprints among scanners. CD matching strategy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e48363d1cd2a02602e04f67f2ae864ac
https://doi.org/10.1109/asmc.2010.5551449
https://doi.org/10.1109/asmc.2010.5551449
Autor:
Guo-Tsai Huang, Noelle Wright, Spencer Lin, L. G. Terng, Wei-Shun Tzeng, Jon Wu, Li-Jui Chen, Mir Shahrjerdy, C. R. Liang, Sophie Peng, Cathy Wang, Gavin Liu, Omer Adam, Willie Wang, Chih-Ming Ke, T. S. Gau, Vivien Wang, Victor Shih, W. T. Yang, Jacky Huang, Sophia Wang, Kaustuve Bhattacharyya, Maurits van der Schaar, Andreas Fuchs, John Lin, H. J. Lee, Heng-Hsin Liu, Marc Noot, Jim Chen
Publikováno v:
SPIE Proceedings.
Advanced lithography is becoming increasingly demanding when speed and sophistication in communication between litho and metrology (feedback control) are most crucial. Overall requirements are so extreme that all measures must be taken in order to me
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::705163b9d6ce68c2eeef8c70cc58b6a9
https://doi.org/10.1117/12.853318
https://doi.org/10.1117/12.853318
Autor:
Sophia Wang, Alan Ho, Guo-Tsai Huang, Cathy Wang, Jon Wu, Vivien Wang, L. G. Terng, Willie Wang, Victor Shih, Noelle Wright, Spencer Lin, W. T. Yang, Mir Shahrjerdy, John Lin, Jacky Huang, Karel van der Mast, Omer Adam, Chih-Ming Ke, H. J. Lee, Dennis Chang, H. H. Liu, C. R. Liang, H. L. Chung, T. S. Gau, Maurits van der Schaar, Li-Jui Chen, Sophie Peng, Kaustuve Bhattacharyya, Andreas Fuchs
Publikováno v:
SPIE Proceedings.
ASML Advanced lithography is becoming increasingly demanding when speed and sophistication in communication between litho and metrology (feedback control) are most crucial. Overall requirements are so extreme that all measures must be taken in order
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bf9354fdc632039118e4ca608acb0571
https://doi.org/10.1117/12.837353
https://doi.org/10.1117/12.837353