Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Soo-Ouk Jang"'
Autor:
In-Je Kang, Chang-Hyun Cho, Hyonu Chang, Soo-Ouk Jang, Hyun-Jae Park, Dae-Gun Kim, Kyung-Min Lee, Ji-Hun Kim
Publikováno v:
Nanomaterials, Vol 11, Iss 7, p 1705 (2021)
To validate the possibility of the developed microwave plasma source with a novel structure for plasma aerosol deposition, the characteristics of the plasma flow velocity generated from the microwave plasma source were investigated by a Mach probe wi
Externí odkaz:
https://doaj.org/article/0be9c9e4f44a46888a57a750e0aefac2
Autor:
Soo Ouk Jang, Changhyun Cho, Ji Hun Kim, In Je Kang, Hyonu Chang, Hyunjae Park, Kyungmin Lee, Dae Gun Kim, Hye Won Seok
Publikováno v:
Ceramics, Vol 5, Iss 4, Pp 1174-1184 (2022)
To improve plasma and chemical resistance on various vacuum components used for semiconductor manufacturing equipment, various ceramic coating techniques have been applied. Among these methods for ceramic coating, the well-known atmospheric plasma sp
Externí odkaz:
https://doaj.org/article/bfd49fd3ecc84a52b653953d812e4e89
Autor:
In Je Kang, Hyonu Chang, Yong-Sup Choi, Soo Ouk Jang, Chang Hyun Cho, Ji Hun Kim, Hyun Jae Park
Publikováno v:
Current Applied Physics. 39:45-50
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8358d8137c0a109fc52fc37ecca905bc
https://doi.org/10.1016/j.cap.2022.03.019
https://doi.org/10.1016/j.cap.2022.03.019
Autor:
Chiwoo Kim, Jae Hoon Jung, Jin Nyoung Jang, Jong Hwa Lee, Kiro Jung, Ho-Won Yoon, Sangheon Lee, Donghoon Kim, Mun-Pyo Hong, Sang-Gab Kim, Soo Ouk Jang
Publikováno v:
SID Symposium Digest of Technical Papers. 53:729-732
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5520f9f8c0877c38ddbb7dea9f400a5a
https://doi.org/10.1002/sdtp.15593
https://doi.org/10.1002/sdtp.15593
Publikováno v:
Nanomaterials; Volume 12; Issue 12; Pages: 1959
The demand for synthetic diamonds and research on their use in next-generation semiconductor devices have recently increased. Microwave plasma chemical vapor deposition (MPCVD) is considered one of the most promising techniques for the mass productio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9a3f33ff043b0df94b385787b4766f13
https://pubmed.ncbi.nlm.nih.gov/35745298
https://pubmed.ncbi.nlm.nih.gov/35745298
Autor:
Soo-Ouk Jang, Hyun-Jae Park, Chang-Hyun Cho, Hyonu Chang, In-Je Kang, JiHun Kim, Kyung-Min Lee, Dae-gun Kim
Publikováno v:
Nanomaterials
Nanomaterials, Vol 11, Iss 1705, p 1705 (2021)
Volume 11
Issue 7
Nanomaterials, Vol 11, Iss 1705, p 1705 (2021)
Volume 11
Issue 7
To validate the possibility of the developed microwave plasma source with a novel structure for plasma aerosol deposition, the characteristics of the plasma flow velocity generated from the microwave plasma source were investigated by a Mach probe wi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::07148a9dfd33670e7ed63283779022d4
http://europepmc.org/articles/PMC8305430
http://europepmc.org/articles/PMC8305430
Publikováno v:
Thin Solid Films. 707:138084
Silicon carbide (SiC) is an emerging material for applications in ultra-precision devices and space optics due to its low thermal expansion characteristics (3.8×10−6/℃) and light density (3g/cm³). However, machining and polishing of SiC are cha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::49b506cfcdeb54c66802588b248949f6
https://doi.org/10.1016/j.tsf.2020.138084
https://doi.org/10.1016/j.tsf.2020.138084
Autor:
Heon Lee, Jae Yang Park, Hyun Jong You, In Uk Hwang, Young-Woo Kim, Yong Ho Jung, Soo Ouk Jang
Publikováno v:
Plasma Chemistry and Plasma Processing. 34:229-237
To deposit copper seed layer on ultra large scale integration devices, a large-area (O 378 mm) electron cyclotron resonance plasma has been generated by using permanent magnets-embedded Lisitano antenna. The plasma source operates in the pressure ran
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ff9e1f766ebdf49edce8b11e7b2aef0f
https://doi.org/10.1007/s11090-013-9504-2
https://doi.org/10.1007/s11090-013-9504-2
Autor:
Yong-Ho Jung, Seung-Heun Lee, Won-Il Choo, Young-Ho Kim, Bong-Ju Lee, D.S. Kim, Soo-Ouk Jang, Sung-Ku Kwon
Publikováno v:
Journal of the Korean Institute of Electrical and Electronic Material Engineers. 22:448-454
Hydrogen was produced from water plasma excited in high frequency (HF) inductively coupled tubular reactor. Mass spectrometry was used to monitor gas phase species at various process conditions, Water dissociation rate depend on the process parameter
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b92275475e5ac0fee30df9c665da5683
https://doi.org/10.4313/jkem.2009.22.5.448
https://doi.org/10.4313/jkem.2009.22.5.448
Publikováno v:
Chinese Physics Letters. 30:065204
Hydrogen is produced by direct dissociation of water vapor, i.e., splitting water molecules by the electrons in water plasma at low pressure (
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::10ffafa578e1366ca7a78f3361ebc784
https://doi.org/10.1088/0256-307x/30/6/065204
https://doi.org/10.1088/0256-307x/30/6/065204