Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Sonia M. Buckley"'
Autor:
Adam N. McCaughan, Bakhrom G. Oripov, Natesh Ganesh, Sae Woo Nam, Andrew Dienstfrey, Sonia M. Buckley
Publikováno v:
APL Machine Learning, Vol 1, Iss 2, Pp 026118-026118-14 (2023)
We present multiplexed gradient descent (MGD), a gradient descent framework designed to easily train analog or digital neural networks in hardware. MGD utilizes zero-order optimization techniques for online training of hardware neural networks. We de
Externí odkaz:
https://doaj.org/article/d79b9244ac1f4858ac3333f96876223c
Autor:
Saeed Khan, Sonia M. Buckley, Jeff Chiles, Richard P. Mirin, Sae Woo Nam, Jeffrey M. Shainline
Publikováno v:
APL Photonics, Vol 5, Iss 5, Pp 056101-056101-8 (2020)
We demonstrate adiabatically tapered fibers terminating in sub-micron tips that are clad with a higher-index material for coupling to an on-chip waveguide. This cladding enables coupling to a high-index waveguide without losing light to the buried ox
Externí odkaz:
https://doaj.org/article/d353fdbc38ca49c98eaba2fa2eea0dcd
Publikováno v:
APL Photonics, Vol 3, Iss 10, Pp 106101-106101-11 (2018)
We design, fabricate, and characterize integrated photonic routing manifolds with 10 inputs and 100 outputs using two vertically integrated planes of silicon nitride waveguides. We analyze manifolds via top-view camera imaging. This measurement techn
Externí odkaz:
https://doaj.org/article/d4400697acef4ac4991912796ed9d0dd
Autor:
Saeed Khan, Bryce A. Primavera, Jeff Chiles, Adam N. McCaughan, Sonia M. Buckley, Alexander N. Tait, Adriana Lita, John Biesecker, Anna Fox, David Olaya, Richard P. Mirin, Sae Woo Nam, Jeffrey M. Shainline
Publikováno v:
Nature Electronics. 5:650-659
Autor:
Jeffrey M. Shainline, Sonia M. Buckley, Nima Nader, Cale M. Gentry, Kevin C. Cossel, Justin W. Cleary, Miloš Popović, Nathan R. Newbury, Sae Woo Nam, Richard P. Mirin
Publikováno v:
Optics express. 25(9)
We present an approach to fabrication and packaging of integrated photonic devices that utilizes waveguide and detector layers deposited at near-ambient temperature. All lithography is performed with a 365 nm i-line stepper, facilitating low cost and