Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Songyong Pan"'
Autor:
Jinghao Xu, Yang Bu, Ting Shu, Lili Fan, Shaoqing Wang, Fenghua Yuan, Songyong Pan, Xiangzhao Wang, Fengzhao Dai, Xiaona Yan
Publikováno v:
Applied optics. 60(31)
Wafer alignment is the core technique of lithographic tools. Image-processing-based wafer alignment techniques are commonly used in lithographic tools. An alignment algorithm is used to analyze the alignment mark image for obtaining the mark position
Autor:
Jinghao Xu, Xiangzhao Wang, Fengzhao Dai, Lili Fan, Shaoqing Wang, Songyong Pan, Fenghua Yuan, Ting Shu, Yang Bu
Publikováno v:
Applied Optics. 60:5569
We propose a novel measurement algorithm for wafer alignment technology based on principal component analysis (PCA) of a mark image. The waveform of the mark is extracted from the enlarged mark image, which is collected by CCD. The position of the ma