A Monte Carlo study of an electron beam pumped cw argon ion laser.

Autor: Sogard, M. R., Feng, I.-J.

Publikováno v: Journal of Applied Physics; 3/1/1988, Vol. 63 Issue 5, p1313, 8p, 6 Graphs

An empirical study of electron backscattering from thin films.

Autor: Sogard, M. R.

Publikováno v: Journal of Applied Physics; Aug1980, Vol. 51 Issue 8, p4417-4425, 9p

Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance for extreme ultraviolet lithography.

Autor: Sogard, M. R., Mikkelson, A. R., Nataraju, M., Turner, K. T., Engelstad, R. L.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; Nov/Dec2007, Vol. 25 Issue 6, p2155-2161, 7p, 3 Diagrams, 5 Graphs

Wafer heating analysis for electron-beam projection lithography.

Autor: Chang, J., Nellis, G. F., Engelstad, R. L., Lovell, E. G., Sogard, M. R.

Publikováno v: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 2003, Vol. 21 Issue 6, p2657-2662, 6p

Elastic Scattering Crossovers from 50 to 175 GeV

Autor: Anderson, R L, Anelli, E F, Ayres, D S, Barton, D S, Brenner, A E, Butler, J, Cutts, D, Demarzo, C, Diebold, R, Elias, J E, Fines, J, Friedman, Jerome Isaac, Gittelman, B, Gottschalk, B, Guerriero, L, Gustavson, D B, Kendall, H W, Lanou, R E, La Vopa, P, Levinson, L J, Litt, John, Loh, E, MacLay, G J, Maggi, G, Massimo, J T, Meunier, R, Mikenberg, G, Nelson, B, Posa, F, Rich, K, Ritson, D M, Rosenson, L, Selvaggi, G, Sogard, M R, Spinelli, P, Verdier, R, Waldner, F, Weitsch, G A

Publikováno v: Physical Review Letters. 37:1025-1027

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::70d0bbf31159a0f17eb99bd5385c34fb
https://doi.org/10.1103/physrevlett.37.1025