Výsledky vyhledávání - "Snelgrove, Matthew"

Fabrication of high-κ dielectric metal oxide films on topographically patterned substrates: polymer brush mediated depositions

Autor: Yadav, Pravind, Gatensby, Riley, Prochukhan, Nadezda, Padmanabhan, Sibu C., Davó-Quiñonero, Arantxa, Darragh, Philip, Senthamaraikannan, Ramsankar, Murphy, Brid, Snelgrove, Matthew, McFeely, Caitlin, Singh, Sajan, Conway, Jim, O'Connor, Robert, McGlynn, Enda, Lundy, Ross, Morris, Michael A.

Publikováno v: Yadav, Pravind ORCID: 0000-0002-7267-9142 , Gatensby, Riley ORCID: 0000-0002-3941-6121 , Prochukhan, Nadezda ORCID: 0000-0002-2535-7132 , Padmanabhan, Sibu C. ORCID: 0000-0002-2489-4307 , Davó-Quiñonero, Arantxa ORCID: 0000-0001-9776-3458 , Darragh, Philip ORCID: 0000-0001-9531-8705 , Senthamaraikannan, Ramsankar, Murphy, Brid, Snelgrove, Matthew ORCID: 0000-0003-0344-1146 , McFeely, Caitlin ORCID: 0000-0002-0447-8250 , Singh, Sajan, Conway, Jim ORCID: 0000-0003-4282-2240 , O'Connor, Robert ORCID: 0000-0001-5794-6188 , McGlynn, Enda ORCID: 0000-0002-3412-9035 , Lundy, Ross ORCID: 0000-0002-1329-8614 and Morris, Michael A. ORCID: 0000-0001-8756-4068 (2022) Fabrication of high-κ dielectric metal oxide films on topographically patterned substrates: polymer brush mediated depositions. ACS Applied Materials & Interfaces, 14 . pp. 32729-32737. ISSN 1944-8244

Fabrication of ultrathin films of dielectric (with particular reference to materials with high dielectric constants) materials has significance in many advanced technological applications including hard protective coatings, sensors, and next generati

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od_______119::e69220fbf74e16a612302c1c477478a2
http://doras.dcu.ie/27558/

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Characterising infiltration techniques in polymer area selective deposition

Autor: Snelgrove, Matthew

Publikováno v: Snelgrove, Matthew ORCID: 0000-0003-0344-1146 (2022) Characterising infiltration techniques in polymer area selective deposition. PhD thesis, Dublin City University.

The integrated circuit (IC) and the vast number of transistors that each one contains has revolutionised how humanity lives in the 21st century. Key to the near constant progress in modern electronics is the photolithography process of ‘top down’

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od_______119::f396b7b57335e9a1926726aaa8787348
http://doras.dcu.ie/26595/

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Analysing trimethylaluminum infiltration intopolymer brushes using a scalable area selectivevapor phase process

Autor: Snelgrove, Matthew, McFeely, Caitlin, Shiel, Kyle, Hughes, Greg, Yadav, Pravind, Weiland, C., Woicik, J.C., Mani-González, Pierre Giovanni, Lundy, Ross, Morris, Michael A., McGlynn, Enda, O'Connor, Robert

Publikováno v: Snelgrove, Matthew ORCID: 0000-0003-0344-1146 , McFeely, Caitlin ORCID: 0000-0002-0447-8250 , Shiel, Kyle, Hughes, Greg ORCID: 0000-0003-1310-8961 , Yadav, Pravind ORCID: 0000-0002-2535-7132 , Weiland, C., Woicik, J.C., Mani-González, Pierre Giovanni ORCID: 0000-0001-6993-2349 , Lundy, Ross ORCID: 0000-0002-1329-8614 , Morris, Michael A. ORCID: 0000-0001-8756-4068 , McGlynn, Enda ORCID: 0000-0002-3412-9035 and O'Connor, Robert ORCID: 0000-0001-5794-6188 (2021) Analysing trimethylaluminum infiltration intopolymer brushes using a scalable area selectivevapor phase process. Materials Advances, 2 . pp. 769-781. ISSN 2633-5409

Developing vapor phase infiltration (VPI) processes for area selective polymer nanopatterning requires substantial advancement in understanding precursor infiltration, precursor–polymer interaction and process parameters. In this work, infiltration

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od_______119::04b8b8760e8cd9386b7b35aa69bbcb54
http://doras.dcu.ie/25772/

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Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance

Autor: O'Donnell, Shane, Jose, Feljin, Shiel, Kyle, Snelgrove, Matthew, McFeely, Caitlin, McGill, E., O'Connor, Robert

Publikováno v: O'Donnell, Shane, Jose, Feljin, Shiel, Kyle, Snelgrove, Matthew ORCID: 0000-0003-0344-1146 , McFeely, Caitlin ORCID: 0000-0002-0447-8250 , McGill, E. and O'Connor, Robert ORCID: 0000-0001-5794-6188 (2021) Thermal and plasma enhanced atomic layer deposition of ultrathin TiO2 on silicon from amide and alkoxide precursors: growth chemistry and photoelectrochemical performance. Journal of Physics D: Applied Physics, 55 (8). ISSN 0022-3727

Due to its low cost and suitable band gap, silicon has been studied as a photoanode material for some time. However, as a result of poor stability during the oxygen evolution reaction (OER), Si still remains unsuitable for any extended use. Ultra-thi

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=od_______119::b7c7c2943292d1d08843f260d25f3618
http://doras.dcu.ie/27893/

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