Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Slava Rokitski"'
Autor:
Mathew Abraham, Rob Rafac, Georgiy O. Vaschenko, Andrew LaForge, Bruno La Fontaine, Daniel J. Riggs, Yezheng Tao, Matthew J. Graham, Ted Taylor, M. Vargas, Michael Kats, Slava Rokitski, Alexander Schafgans, Igor V. Fomenkov, Daniel J. W. Brown, Silvia De Dea, David C. Brandt, Michael Purvis, Alex I. Ershov, Steven Chang, Jayson Stewart
Publikováno v:
Advanced Optical Technologies. 6:173-186
Extreme ultraviolet (EUV) lithography is expected to succeed in 193-nm immersion multi-patterning technology for sub-10-nm critical layer patterning. In order to be successful, EUV lithography has to demonstrate that it can satisfy the industry requi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::666934d1a78d84c3354415275ca80f78
https://doi.org/10.1515/aot-2017-0029
https://doi.org/10.1515/aot-2017-0029
Autor:
Martijn Leenders, David C. Brandt, Jayson Stewart, Yezheng Tao, Michael Purvis, Alex I. Ershov, Hummler Klaus Martin, Silvia De Dea, Peter Mayer, Georgiy O. Vaschenko, Slava Rokitski, Alexander Schafgans, Daniel Brown, Igor V. Fomenkov, Robert J. Rafac
Publikováno v:
X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XIII.
In this paper, we provide an overview of state-of-the-art technologies for incoherent laser-produced tin plasma extreme-ultraviolet (EUV) sources at 13.5nm with performance enabling high volume semiconductor manufacturing (HVM). The key elements to d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::647f3e032b2e7fe52d8fc99fb203cc98
https://doi.org/10.1117/12.2534691
https://doi.org/10.1117/12.2534691
Autor:
Andrew LaForge, Jayson Stewart, Slava Rokitski, Robert J. Rafac, Igor V. Fomenkov, David C. Brandt, Michael Purvis, Chirag Rajyaguru, Mathew Abraham, Yezheng Tao, Daniel Brown, Alexander Schafgans, Silvia De Dea, Alexander I. Ershov, Georgiy O. Vaschenko
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2018.
We provide an overview of laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source performance to enable high volume manufacturing and improvements in various technologies for scaling output power of the source. Several companies have multiple sy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a28ef29025e3c8148c56419ba9090d7b
https://doi.org/10.1117/12.2502801
https://doi.org/10.1117/12.2502801
Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W
Autor:
Alexander Schafgans, Melchior Mulder, Robert J. Rafac, Jayson Stewart, Spencer Rich, Yezheng Tao, Slava Rokitski, Erik Petrus Buurman, David C. Brandt, Michael Kats, Andrew LaForge, Georgiy O. Vaschenko, Michael Purvis, Alex I. Ershov, Chirag Rajyaguru, Daniel Brown, Igor V. Fomenkov, Mathew Abraham, M. Vargas
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IX.
In this paper, we provide an overview of various technologies for scaling tin laser-produced-plasma (LPP) extremeultraviolet (EUV) source performance to enable high volume manufacturing (HVM). We will show improvements to source architecture that fac
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ecce3e24295f1889b93cdb47fb9b46e0
https://doi.org/10.1117/12.2305955
https://doi.org/10.1117/12.2305955
Autor:
Georgiy O. Vaschenko, Michael Purvis, Yezheng Tao, Robert J. Rafac, Slava Rokitski, Igor V. Fomenkov, Alexander Schafgans, David C. Brandt, Daniel J. W. Brown
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VIII.
In this paper, we provide an overview of various challenges and their solutions for scaling laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source performance to enable high volume manufacturing. We will discuss improvements to source architect
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::57644f9ffffeee19e12144897b20a06e
https://doi.org/10.1117/12.2258628
https://doi.org/10.1117/12.2258628
Autor:
Michael Purvis, Alexander Schafgans, Rob Rafac, Alberto Pirati, Slava Rokitski, Igor V. Fomenkov, Mathew Abraham, Howard A. Scott, Aaron Fisher, Ted Taylor, Daniel J. W. Brown, Alice Koniges, M. Vargas, A. Link, Steven H. Langer, David C. Eder, Spencer Rich, Scott Wilks, Yezheng Tao, Josh Brown, David C. Brandt
Publikováno v:
Extreme Ultraviolet (EUV) Lithography VII.
We present highlights from plasma simulations performed in collaboration with Lawrence Livermore National Labs. This modeling is performed to advance the rate of learning about optimal EUV generation for laser produced plasmas and to provide insights
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::86cc3ba615b0c270c254ef2b30731421
https://doi.org/10.1117/12.2221991
https://doi.org/10.1117/12.2221991
Autor:
Yezheng Tao, Phil Conklin, M. Vargas, Michael Purvis, Rob Rafac, Michael Kats, Daniel Brown, Lukasz Urbanski, Jonathan Grava, Mathew Abraham, Spencer Rich, Jayson Stewart, David C. Brandt, Slava Rokitski, Palash P. Das, Igor V. Fomenkov, Alexander Schafgans, Rick Sandstrom
Publikováno v:
Conference on Lasers and Electro-Optics.
Cymer-ASML is committed to develop high power EUV source technology based on CO 2 laser-produced-plasma (LPP) for use in EUV lithography for high-volume-manufacturing of semiconductors. Stable dose controlled EUV power at intermediate focus (IF) has
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fe5ee4680da8ca9392d697ffb73d58be
https://doi.org/10.1364/cleo_at.2016.am2k.4
https://doi.org/10.1364/cleo_at.2016.am2k.4
Autor:
Oleg Kritsun, Bruno La Fontaine, Bill Partlo, Harry J. Levinson, Slava Rokitski, Ivan Lalovic, Nigel R. Farrar
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2145-2150
In this article the authors discuss the impact of coherence, or laser speckle, of current generation 193nm argon fluoride (ArF) excimer sources on lithographic patterning. They report a new metrology capability to characterize single-pulse speckle pa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d310854bd807171bf5f11bd85a1d9989
https://doi.org/10.1116/1.2992027
https://doi.org/10.1116/1.2992027
Autor:
Daniel J. Riggs, Rick Sandstrom, Slava Rokitski, Igor V. Fomenkov, Yezheng Tao, Rob Rafac, Christian Wagner, Norbert R. Bowering, Wayne J. Dunstan, Georgiy O. Vaschenko, Noreen Harned, Ron Kool, Hans Meiling, Alexander Schafgans, Alberto Pirati, Matthew J. Graham, Nigel R. Farrar, Daniel J. W. Brown, David C. Brandt, Michael Purvis, Alex I. Ershov
Publikováno v:
SPIE Proceedings.
This paper describes the development and evolution of the critical architecture for a laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source for advanced lithography applications in high volume manufacturing (HVM). In this paper we discuss the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::13193246557204944c3f3c3abbfa1a0b
https://doi.org/10.1117/12.2087421
https://doi.org/10.1117/12.2087421
Autor:
Omar Zurita, Yookeun Won, Joshua Thornes, Jinphil Choi, Bernd Burfeindt, Nakgeuon Seong, Young-Seog Kang, Slava Rokitski, Chan-Hoon Park
Publikováno v:
SPIE Proceedings.
In order to improve process control of the lithography process, enhanced On-board metrology, measuring of the light source beam parameters with software solutions for monitoring, reporting and analyzing the light source's performance has been introdu
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b5a936b8819abab8cfe05e53e66d4b45
https://doi.org/10.1117/12.917900
https://doi.org/10.1117/12.917900