Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Sjoerd Oostrom"'
Publikováno v:
SPIE Proceedings.
We report on our findings on EUVL reticle contamination removal, inspection and repair. We show that carbon contamination can be removed without damage to the reticle by our plasma process. Also organic particles, simulated by PSL spheres, can be rem
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6de96713c83db2464d67d5a9794c11da
https://doi.org/10.1117/12.879216
https://doi.org/10.1117/12.879216
Publikováno v:
La Fontaine, B.M.Naulleau, P.P., Extreme Ultraviolet (EUV) Lithography II, 28 February 2011 through 3 March 2011, San Jose, CA. Conference code: 85007, 7969, 79691Q-1-79691Q-10
Before new equipment for handling of EUV reticles can be used, it should be shown that the apparatus is qualified for operating at a sufficiently clean level. TNO developed a qualification procedure that is separated into two parts: reticle handling
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f62e0003d80d63e742b32e6670683a64
https://doi.org/10.1117/12.879370
https://doi.org/10.1117/12.879370
Autor:
Sander van Reek, Jetske Stortelder, Rob Snel, Sjoerd Oostrom, Alfred Abutan, Bert van der Zwan, Jacques van der Donck, Peter van der Walle
Publikováno v:
Extreme Ultraviolet (EUV) Lithography II, 28 February 2011 through 3 March 2011, San Jose, CA, USA, 7969
Since 2006 EUV Lithographic tools have been available for testing purposes giving a boost to the development of fab infrastructure for EUV masks. The absence of a pellicle makes the EUV reticles extremely vulnerable to particles. Therefore, the fab i
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4676eb14d576fdefc2617771306192c7
http://resolver.tudelft.nl/uuid:d6769fe6-36d5-4176-92c6-8aafb0e127bb
http://resolver.tudelft.nl/uuid:d6769fe6-36d5-4176-92c6-8aafb0e127bb
