Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Sin Hye Na"'
Publikováno v:
Journal of Alloys and Compounds. 957:170438
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a12c7cd19cd02c42043585855512174a
https://doi.org/10.1016/j.jallcom.2023.170438
https://doi.org/10.1016/j.jallcom.2023.170438
Autor:
Sang-Ho Oh, Donghyuk Seol, Yang-Jin Jeong, Sin-Hye Na, Jiman Kim, Won-Seok Ko, Jong Bae Jeon, Byeong-Joo Lee
Publikováno v:
Acta Materialia. 234:118050
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2d240bdb186fb8bee6df057b1e73faf7
https://doi.org/10.1016/j.actamat.2022.118050
https://doi.org/10.1016/j.actamat.2022.118050
Publikováno v:
SSRN Electronic Journal.
Detailed diffusion mechanism in the A15 Nb3Sn superconducting compound has been investigated using an atomistic simulation based on a newly developed interatomic potential for the Nb-Sn binary alloy system. In terms of volume diffusion, Sn atoms diff
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::eae10449413f71820065c95f1b9996e7
https://doi.org/10.2139/ssrn.3966911
https://doi.org/10.2139/ssrn.3966911
Publikováno v:
Journal of the Korean Physical Society. 69:310-315
Unlike the NbTi superconducting wires used for high critical current density, NbTi wires for Magnetic resonance imaging (MRI) magnets have larger and fewer NbTi monofilaments and different cross sections, which show different superconducting properti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c042aff5b6e57c7ceca367d63eeb688d
https://doi.org/10.3938/jkps.69.310
https://doi.org/10.3938/jkps.69.310
Autor:
Sin-Hye Na, Soon-Gil Yoon
Publikováno v:
Korean Journal of Materials Research. 21:78-82
Mono- and few-layer graphenes were grown on Ni thin films by rapid-thermal pulse chemical vapor deposition technique. In the growth steps, the exposure step for 60 s in (a flow rate of 10 sccm (standard cubic centimeters per minute)) atmosphere after
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3e38fd010a484f44972376a7b4883e6e
https://doi.org/10.3740/mrsk.2011.21.2.78
https://doi.org/10.3740/mrsk.2011.21.2.78
Publikováno v:
RSC Advances. 2:5214
Reliable graphenes grown by rapid-thermal pulse chemical vapor deposition (CVD) for electrode applications were selectively patterned under optimum conditions for argon rf plasma power and etching time. For the transparent and the flexible capacitors
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bc3f3f9664e229652f575754aa323520
https://doi.org/10.1039/c2ra20463k
https://doi.org/10.1039/c2ra20463k