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pro vyhledávání: '"Simon Reinald Huisman"'
Autor:
Shawn Lee, Gijs ten Haaf, Henry Megens, Igor Matheus Petronella Aarts, Leendertjan Karssemeijer, Jan Mulkens, Daan Slotboom, Haico Victor Kok, Ralph Brinkhof, Evert Mos, Simon Reinald Huisman, Emil Schmitt-Weaver, Kaustuve Bhattacharyya, Manouk Rijpstra, Irina Lyulina, Robert John Socha, Boris Menchtchikov, Stefan Carolus Jacobus Antonius Keij, Wim Tjibbo Tel, Chris de Ruiter, Michael Kubis
Publikováno v:
Optical Microlithography XXXII
Multi-patterning lithography for future technology nodes in logic and memory are driving the allowed on-product overlay error in an DUV and EUV matched machine operation down to values of 2 nm and below. The ASML ORION alignment sensor provides an ef
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::783d1943d7337abc9346b91e2b12d413
