Growth of co-sputtered titanium-strontium films: influence of strontium concentration and ion bombardment

Autor: Simon Jacobi Rosendal, M. Sillassen, Jørgen Bøttiger, S. Louring, N.D. Madsen

Publikováno v: Sillassen, M, Rosendal, S J, Louring, S, Madsen, N D & Bøttiger, J 2014, ' Growth of co-sputtered titanium-strontium films : Influence of strontium concentration and ion bombardment ', Thin Solid Films, vol. 550, pp. 170-176 . https://doi.org/10.1016/j.tsf.2013.10.147

Strontium-containing titanium films were synthesized by non-reactive magnetron sputtering from elemental targets. Three series of depositions were carried out at (1) different relative Sr-to-Ti target powers, (2) different sputter-gas pressures, and

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d2207470af09860ce8f95f200c8f32bd
https://doi.org/10.1016/j.tsf.2013.10.147