Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Simon Hsieh"'
Autor:
Simon Hsieh, Stephen Hsu, Will Conley, Jason Shieh, Tsann-Bim Chiou, Paolo Alagna, Greg Rechtsteiner
Publikováno v:
SPIE Proceedings.
Over the years, lithography engineers continue to focus on CD control, overlay and process capability to meet current node requirements for yield and device performance. Use of ArFi lithography for advanced process nodes demands challenging patternin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::25d565a5bc1925877006f82f9358f5b6
https://doi.org/10.1117/12.2260210
https://doi.org/10.1117/12.2260210
Publikováno v:
SPIE Proceedings.
Double-patterning ArF immersion lithography continues to advance the patterning resolution and overlay requirements and has enabled the continuation of semiconductor bit-scaling. Over the years Lithography Engineers continue to focus on CD control, o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ad2f149eacaa904e752fe821ebcd606e
https://doi.org/10.1117/12.2085826
https://doi.org/10.1117/12.2085826
Autor:
Xiaoxu Xie, R. C. Peng, John Lin, H. J. Lee, Chia-Yang Chang, Rafael Aldana, Simon Hsieh, Chih-Tsung Shih, H. H. Liu, Ronald Goossens, W. H. Hung, Wenjin Shao, H. C. Wu, Chii-Ming M. Wu, Yi-Yin Chen, Y. Cao, Tommy Lee, Tsung-Chih Chien, K. W. Chang
Publikováno v:
27th European Mask and Lithography Conference.
Given the continually decreasing k1 factor and process latitude in advanced technology nodes, it is important to fully understand and control the variables that impact imaging behavior in the lithography process. In this joint work between TSMC and A
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::bb9f9a764ae9d934ae6a29172953c0c3
https://doi.org/10.1117/12.882764
https://doi.org/10.1117/12.882764
Autor:
Omer Adam, R. Goossens, Wen-Chuan Wang, Andreas Fuchs, Mir Shahrjerdy, Karel van der Mast, Sophia Wang, Vivien Wang, Y. Cao, T. S. Gao, Jon Wu, Tsung-Chih Chien, X. Xie, W. T. Yang, Sophie Peng, R. C. Peng, H. H. Liu, Noelle Wright, Kaustuve Bhattacharyya, Szu-Yuan Lin, W. Lin, Jacky Huang, Simon Hsieh, Chih-Ming Ke, K. Lin, Maurits van der Schaar, Victor Shih, W. Shao, Chau Hui Wang, Yi-Yin Chen, John Lin, H. J. Lee, Miranda Un
Publikováno v:
2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
In this work, we propose a new technique for comprehensive scanner matching to fundamentally improve scanner productivity in a Giga fab. The proposal covers matching solutions for both CD and overlay fingerprints among scanners. CD matching strategy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e48363d1cd2a02602e04f67f2ae864ac
https://doi.org/10.1109/asmc.2010.5551449
https://doi.org/10.1109/asmc.2010.5551449
Autor:
Hsin-Chang Lee, Rafael Aldana, C. P. Yeh, Xu Xie, R. C. Peng, Simon Hsieh, Chih-Tsung Shih, A. Bruguier, John Lin, H. Cao, Y. W. Guo, Ching-Yu Chang, Ronald Goossens, P. C. Huang, H. H. Liu, Tsung-Chih Chien, Y. Cao, Jen-Tin Lee, K. W. Chang, Wenjin Shao, Chia-Yang Chang
Publikováno v:
SPIE Proceedings.
Given the decrease in k1 factor for 65nm-node lithography technology and beyond, it is increasingly important to understand and control the variables which impact scanner imaging behavior in the lithography process. In this work, we explore using mod
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::21a6d04acc1cdf2a1adcb0f41abe2cfd
https://doi.org/10.1117/12.813974
https://doi.org/10.1117/12.813974