Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Silvestre, Mary Claire"'
Autor:
Karunaratne, Geethan, Hersche, Michael, Langenegger, Jovin, Cherubini, Giovanni, Gallo-Bourdeau, Manuel Le, Egger, Urs, Brew, Kevin, Choi, Sam, OK, INJO, Silvestre, Mary Claire, Li, Ning, Saulnier, Nicole, Chan, Victor, Ahsan, Ishtiaq, Narayanan, Vijay, Benini, Luca, Sebastian, Abu, Rahimi, Abbas
Continually learning new classes from a few training examples without forgetting previous old classes demands a flexible architecture with an inevitably growing portion of storage, in which new examples and classes can be incrementally stored and eff
Externí odkaz:
http://arxiv.org/abs/2207.06810
Autor:
Jeffrey, Eswar Ramanathan, Balajee Rajagopalan, Silvestre Mary Claire, Hildreth Scott, Antonio Fiacco, Jean-Baptiste, Barker John, Frank Smith, Val Parks, Laloe, Riendeau
Publikováno v:
2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
In any technology, although we have an edge exclusion (usually around 3mm), defects on the extreme edge almost always kill the saleable dies inside [1][2]. For these reasons, edge defectivity reduction plays an important role on any matured technolog
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0e2c54aaf4432294ff8a185f2beb8915
https://doi.org/10.1109/asmc.2016.7491107
https://doi.org/10.1109/asmc.2016.7491107
Autor:
Rajagopalan, Balajee, Laloe, Jean-Baptiste, Silvestre, Mary Claire, Ramanathan, Eswar, Khanal, Sohana, Laval, Alain, Ge, Qian, Takahashi, Nobuyuki, Mahalingam, Anbu Selvam, Liew, San Leong, Teagle, Robert
Publikováno v:
2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); 2016, p354-357, 4p
Autor:
Silvestre, Mary Claire, Ramanathan, Eswar, Hildreth, Scott, Duggan, Mark, Riendeau, Jeffrey, Dumas, Laurent
Publikováno v:
2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); 2016, p124-128, 5p
Autor:
Silvestre, Mary Claire, Gogna, Mukesh, Mahalingam, Anbu Selvam K M, Ramanathan, Eswar, Ordonio, Christopher, Schaller, John
Publikováno v:
2016 27th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); 2016, p446-450, 5p
Autor:
Ramanathan, Eswar, Silvestre, Mary Claire, Mahalingam, Anbu Selvam KM, Garg, Niti, Siddhartha, Ordonio, Christopher, Schaller, John
Publikováno v:
2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); 2015, p68-71, 4p
Autor:
Silvestre, Mary Claire, Wenyi, Zhang Galor, Selvam, KM Mahalingam Anbu, Ramanathan, Eswar, Ordonio, Christopher, Schaller, John, Hyup, Lee Jong, Capasso, Cristiano, Justison, Patrick
Publikováno v:
2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); 2015, p411-415, 5p
Autor:
Ming He, Ordonio, Christopher, Chun Hui Low, Welti, Peter, Lobb, Granger, Clancy, Aleksandra, Shu, Jeff, Hamouda, Ayman, Stephens, Jason, Shah, Ketan, Chandrasekhar, Ashwini, Silvestre, Mary Claire, Periasamy, Prakash, Mahalingam, Anbu Selvam KM, Pal, Shyam, Child, Craig
Publikováno v:
2016 IEEE International Interconnect Technology Conference / Advanced Metallization Conference (IITC/AMC); 2016, p15-17, 3p
Autor:
Mahalingam, Anbu Selvam KM, Silvestre, Mary Claire, Ramanathan, Eswar, Ordonio, Christopher, Schaller, John
Publikováno v:
2015 26th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC); 2015, p408-410, 3p