Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Silvester Houweling"'
Autor:
Jos Benschop, Wesley van Beld den, Silvester Houweling, Airat Shafikov, Fred Bijkerk, Robbert Wilhelmus Elisabeth van de Kruijs
Publikováno v:
Journal of microelectromechanical systems, 31(1), 63-73. IEEE
In this work, we experimentally measure fracture toughness of free-standing zirconium ZrSiₓ thin films using the crack-on-a-chip method. In this method, fracture toughness is determined from the analysis of cracks, which propagate and arrest in spe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::52dedd643d76ee303873cdbf13d5b532
https://research.utwente.nl/en/publications/f2661099-289a-427c-b643-bd7eae39f453
https://research.utwente.nl/en/publications/f2661099-289a-427c-b643-bd7eae39f453
Autor:
Robbert Wilhelmus Elisabeth van de Kruijs, Jort D. Verbakel, Fred Bijkerk, Z. Silvester Houweling, Seda Kizir, Jos P. H. Benschop, Wesley T. E. van den Beld, Roman Pushkarev
Publikováno v:
Journal of physics D: applied physics, 54(50):505304. IOP Publishing Ltd.
Graphene inherently possesses defect sites and grain boundaries that are vulnerable to chemical etching by hydrogen radicals. In this study, an etch-mitigation method is presented to selectively passivate these sites using atomic layer deposition (AL
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6a1825a078aa3937043edc914963fc65
https://doi.org/10.1088/1361-6463/ac2200
https://doi.org/10.1088/1361-6463/ac2200
Autor:
Zomer Silvester Houweling, Jos Benschop, Bart Schurink, Airat Shafikov, Wesley T. E. van den Beld, Frederik Bijkerk, Robbert Wilhelmus Elisabeth van de Kruijs
Publikováno v:
Sensors and actuators. A: Physical, 317:112456. Elsevier
In this work, the effect of compressive surface stress on thin film membrane fracture was studied by bulge test. In order to create membranes with compressive residual stress at the surface, low-pressure chemical vapor deposition (LPCVD) Si3N4 membra
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e649c8d877ec79d10bd97e6556203568
https://doi.org/10.1016/j.sna.2020.112456
https://doi.org/10.1016/j.sna.2020.112456
Publikováno v:
Materials Chemistry and Physics. 140:89-96
We present the synthesis of tungsten oxide (WO 3− x ) thin films consisting of layers of varying oxygen content. Configurations of layered thin films comprised of W, W/WO 3− x , WO 3 /W and WO 3 /W/WO 3− x are obtained in a single continuous ho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9b058dfbe63cbb1637a99db7cc985af1
https://doi.org/10.1016/j.matchemphys.2013.02.072
https://doi.org/10.1016/j.matchemphys.2013.02.072
Autor:
Silvester Houweling, V. Verlaan, Ruud E. I. Schropp, Karine H. M. van der Werf, H.D. Goldbach
Publikováno v:
Japanese Journal of Applied Physics. 46:1290-1294
The deposition process of silicon nitride (SiNx) by hot-wire chemical vapor deposition (HWCVD) is investigated by exploring the effects of process pressure and gas-flow ratio on the composition of the SiNx films. It appeared that the N/Si ratio in th
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ba09bf43f8fa70033476133b43ca1a96
https://doi.org/10.1143/jjap.46.1290
https://doi.org/10.1143/jjap.46.1290
Autor:
Silvester Houweling, John Zimmerman, Laurens de Winters, Brian Blum, Juan Diego Arias Espinoza, Kamali Mohammad Reza, Yang Liu, Hans Meiling, Marco Reijnen, Joost de Hoogh, Nina Vladimirovna Dziomkina, Kursat Bal, Luigi Scaccabarozzi, Ijen van Mil, Carmen Zoldesi, Ronald Frank Kox, Henk Meijer, Beatrijs Louise Marie-Joseph Katrien Verbrugge, Azeredo Lima Jorge Manuel, Derk Brouns, Robert de Kruif, Alain Kempa, Xiong Xugang, Guus Bock, Daniel Smith, Florian Didier Albin Dhalluin, Maarten Mathijs Marinus Jansen
Publikováno v:
Wood, O.R.Panning, E.M., Extreme Ultraviolet (EUV) Lithography V, 90481N-1-90481N-10
As EUV approaches high volume manufacturing, reticle defectivity becomes an even more relevant topic for further investigation. Current baseline strategy for EUV defectivity management is to design, build and maintain a clean system without pellicle.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::834bd6f420e0f7cc25eefca0c14b11bb
http://resolver.tudelft.nl/uuid:dd53d834-e078-4f7b-85cc-1d9ff6193e19
http://resolver.tudelft.nl/uuid:dd53d834-e078-4f7b-85cc-1d9ff6193e19
Autor:
Karine H. M. van der Werf, Ruud E. I. Schropp, Z. Silvester Houweling, Yinghuan Kuang, Marcel Di Vece
Publikováno v:
Proceedings of the 37th IEEE Photovoltaic Specialists Conference, 19-24 June 2011, Seattle, WA, 802-806
STARTPAGE=802;ENDPAGE=806;TITLE=Proceedings of the 37th IEEE Photovoltaic Specialists Conference, 19-24 June 2011, Seattle, WA
STARTPAGE=802;ENDPAGE=806;TITLE=Proceedings of the 37th IEEE Photovoltaic Specialists Conference, 19-24 June 2011, Seattle, WA
We report on the design and photovoltaic performance of nanostructured three dimensional (nano-3D) solar cells with ultrathin amorphous hydrogenated silicon (a-Si:H) absorber layers. Zinc oxide (ZnO) nanorods are employed as the building blocks for t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::060f4437ce58038ec473508c110bb2dc
https://doi.org/10.1109/pvsc.2011.6186076
https://doi.org/10.1109/pvsc.2011.6186076