Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Sihem Ben Zakour"'
Publikováno v:
2019 6th International Conference on Electrical and Electronics Engineering (ICEEE).
As the exposed area to the film being etched is very thin (< 0.5%), showing the incapacity of the traditional endpoint detection method to determine the endpoint in Plasma etch process. A new proposed Algorithm designed in order to pick the optimal l
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e2596c372e68d0211f90299d436e113b
https://doi.org/10.1109/iceee2019.2019.00070
https://doi.org/10.1109/iceee2019.2019.00070
Publikováno v:
Polish Journal of Medical Physics and Engineering. 22:97-103
A novel scheme for lesions classification in chest radiographs is presented in this paper. Features are extracted from detected lesions from lung regions which are segmented automatically. Then, we needed to eliminate redundant variables from the sub
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e244cc4abc8e20d43e0fbb06889d29ad
https://doi.org/10.1515/pjmpe-2016-0017
https://doi.org/10.1515/pjmpe-2016-0017
Autor:
Sihem Ben Zakour, Hassen Taleb
Endpoint detection is very important undertaking on the side of getting a good understanding and figuring out if a plasma etching process is done in the right way, especially if the etched area is very small (0.1%). It truly is a crucial part of supp
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7097cc966db4d82924e54c7848bdf9f6
https://hdl.handle.net/10419/172565
https://hdl.handle.net/10419/172565
Autor:
Sihem Ben Zakour
Publikováno v:
International Journal of Computer Science and Information Technology. 4:9-22
The development of the semiconductor industry, with advances in sensors oblige us to deal with large datasets do not stop increasing, while monitoring devices are becoming more and more complexes and sophisticated. As the measurement points become cl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4660333261ce12264e0ad8803f9b8958
https://doi.org/10.5121/ijcsit.2012.4402
https://doi.org/10.5121/ijcsit.2012.4402
Autor:
Hassen Taleb, Sihem Ben Zakour
Publikováno v:
International Journal of Computer Applications. 42:33-40
to the development in new technologies like semiconductor industry, with advances in sensors and information technology oblige us to handle with large datasets do not stop increasing, while monitoring devices are becoming more and more complexes and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::bf155f6547750df67ff12d115b7da6b0
https://doi.org/10.5120/5746-7953
https://doi.org/10.5120/5746-7953
Autor:
Sihem Ben Zakour, Hassen Taleb
Publikováno v:
Photonic Sensors. 6(2):158-168
Endpoint detection (EPD) is very important undertaking on the side of getting a good understanding and figuring out if a plasma etching process is done on the right way. It is truly a crucial part of supplying repeatable effects in every single wafer
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ce365ded1815c4adad8783f490b1b508