Výsledky vyhledávání - "Sidelnikov, Y"

Akademický článek

A systematic review and meta-analysis of the prevalence of tick-borne SFGR in China from 2000 to 2022.

Autor: Hu, Yanchao¹ (AUTHOR), Yin, Ting^2,3 (AUTHOR) 20160108@nxmu.edu.cn, Ma, Wei⁴ (AUTHOR), Qiu, Jiangwei² (AUTHOR), Zhang, Jiaxing^2,3 (AUTHOR), Wang, Qingan^2,3 (AUTHOR)

Publikováno v: PLoS Neglected Tropical Diseases. 10/9/2024, Vol. 18 Issue 10, p1-14. 14p.

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Akademický článek

Observations of soft x-ray production in the speed 2 plasma focus.

Autor: Bayley, J. M., Decker, G., Kies, W., Mälzig, M., Müller, F., Röwekamp, P., Westheide, J., Sidelnikov, Y. V.

Publikováno v: Journal of Applied Physics; 1/15/1991, Vol. 69 Issue 2, p613, 5p, 8 Black and White Photographs, 2 Diagrams, 2 Graphs

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Ion beam production at a EUV emitting discharge plasma

Autor: Gielissen, K., Sidelnikov, Y., Glushkov, D., Banine, V.Y., Koshelev, K.N., Mullen, van der, J.J.A.M.

Publikováno v: Proceedings of the 21th NNV-Symposium Plasma Physics & Radiation Technology 2009, 3-4 March 2009, Lunteren, The Netherlands

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Externí odkaz: https://explore.openaire.eu/search/publication?articleId=narcis______::0b53241a9281c1a75b0f41f2e1d61380
https://research.tue.nl/nl/publications/3effbcf6-b5ec-4713-afa2-4b72c238ccb8

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The characterization of the ion beam from a Sn-based DPP with respect to the ignition parameters

Autor: Gielissen, K., Sidelnikov, Y., Soer, W.J., Herpen, van, M.W., Glushkov, D., Banine, V.Y., Mullen, van der, J.J.A.M.

Publikováno v: Proceedings of the 23rd Symposium Plasma Physics & Radiation Technology 2008, 16-19 June 2008, Prague, Czech Republic, 36-36
STARTPAGE=36;ENDPAGE=36;TITLE=Proceedings of the 23rd Symposium Plasma Physics & Radiation Technology 2008, 16-19 June 2008, Prague, Czech Republic
Proceedings of the International Symposium on Extreme Ultraviolet Lithography 2008 (2008 EUV Symposium), 28 September-1 October 2008, Lake Tahoe, USA

Based on several years of development work, multiple source vendors and research institutions dealing with EUV lithography are demonstrating a strong rise in performance of EUV sources. One of the EUV source types, namely Discharge Produced Plasma (D

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::240f4974ae24fe525073938474d66acd
https://research.tue.nl/nl/publications/83f0ca6b-6dc7-468c-9384-1c8ef72e1c9c

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Research on pinch plasma focus devices of hundred of kilojoules to tens of joules

Autor: Soto, L, Silva, P, Moreno, J, Silvester, G, Zambra, M, Pavez, C, Altamirano, L, Bruzzone, H, Barbaglia, M, Sidelnikov, Y, Kies, W

Publikováno v: Brazilian Journal of Physics, Volume: 34, Issue: 4b, Pages: 1814-1821, Published: DEC 2004
Brazilian Journal of Physics v.34 n.4b 2004
Brazilian Journal of Physics
Sociedade Brasileira de Física (SBF)
instacron:SBF
BRAZILIAN JOURNAL OF PHYSICS
Artículos CONICYT
CONICYT Chile
instacron:CONICYT

At present the Plasma Physics and Plasma Technology Group of the Comisión Chilena de Energía Nuclear (CCHEN) has the experimental facilities in order to study fast dense transient discharges in a wide range of energy and current, namely: I) energy

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::824c89edc7e9b41dfe91de9be7292f97
http://www.scielo.br/scielo.php?script=sci_arttext&pid=S0103-97332004000800054&lng=en&tlng=en

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