Zobrazeno 1 - 10
of 342
pro vyhledávání: '"SiKun Li"'
Publikováno v:
Applied Sciences, Vol 12, Iss 4, p 2192 (2022)
As the designed feature size of integrated circuits (ICs) continues to shrink, the lithographic printability of the design has become one of the important issues in IC design and manufacturing. There are patterns that cause lithography hotspots in th
Externí odkaz:
https://doaj.org/article/632265d57a4b46d4b453fd8ef58a98fb
Publikováno v:
Applied Optics.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::686f73bd81605280d84e1570e2db290e
https://doi.org/10.1364/ao.489083
https://doi.org/10.1364/ao.489083
Publikováno v:
Optics Letters.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::96b2d4c50084b6f3ec84da4fe8dd5d33
https://doi.org/10.1364/ol.486384
https://doi.org/10.1364/ol.486384
Publikováno v:
2022 International Workshop on Advanced Patterning Solutions (IWAPS).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c30457cb3b34ee6c8e43aaee1dcda720
https://doi.org/10.1109/iwaps57146.2022.9972306
https://doi.org/10.1109/iwaps57146.2022.9972306
Publikováno v:
2022 International Workshop on Advanced Patterning Solutions (IWAPS).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::238c80a7bcb1b737a63f6d51d400417d
https://doi.org/10.1109/iwaps57146.2022.9972300
https://doi.org/10.1109/iwaps57146.2022.9972300
Publikováno v:
Applied Optics. 62:3623
Double-Ronchi shearing interferometry is a promising wavefront aberration measurement system for advanced lithography projection lens systems. The image grating defocusing is a key systematic error of the interferometer. However, the effects and elim
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::41e5e9631af6e8ea00fd4d357cc51fa6
https://doi.org/10.1364/ao.485832
https://doi.org/10.1364/ao.485832
Publikováno v:
Journal of Computer-Aided Design & Computer Graphics. 33:287-297
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b4b84e5d4ec990ed960357a235d11c8f
https://doi.org/10.3724/sp.j.1089.2021.18394
https://doi.org/10.3724/sp.j.1089.2021.18394
Publikováno v:
Tsinghua Science and Technology. 25:103-116
Soft errors have become a critical challenge as a result of technology scaling. Existing circuit-hardening techniques are commonly associated with prohibitive overhead of performance, area, and power. However, evaluating the influence of soft errors
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e1305373487622967350e905bcb22cfe
https://doi.org/10.26599/tst.2018.9010136
https://doi.org/10.26599/tst.2018.9010136
Publikováno v:
Applied Optics. 62:1243
The multilayer defects of mask blanks in extreme ultraviolet (EUV) lithography may cause severe reflectivity deformation and phase shift. The profile information of a multilayer defect is the key factor for mask defect compensation or repair. This pa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9fda2c089d02912be30b235054a43ad3
https://doi.org/10.1364/ao.480356
https://doi.org/10.1364/ao.480356
Autor:
Yuguang Chen, Sikun Li, Jianfang He, Libin Zhang, Weijie Shi, Ming Tang, Yayi Wei, Xiangzhao Wang
Publikováno v:
2021 International Workshop on Advanced Patterning Solutions (IWAPS).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8ab31dd17dffa6321e5444108aacedc2
https://doi.org/10.1109/iwaps54037.2021.9671250
https://doi.org/10.1109/iwaps54037.2021.9671250