Zobrazeno 1 - 10
of 68
pro vyhledávání: '"Si-Jun Kim"'
Autor:
Si-jun Kim, Young-seok Lee, Chul-hee Cho, Min-su Choi, In-ho Seong, Jang-jae Lee, Dae-woong Kim, Shin-jae You
Publikováno v:
Scientific Reports, Vol 12, Iss 1, Pp 1-11 (2022)
Abstract Arcing is a ubiquitous phenomenon and a crucial issue in high-voltage applied systems, especially low-temperature plasma (LTP) engineering. Although arcing in LTPs has attracted interest due to the severe damage it can cause, its underlying
Externí odkaz:
https://doaj.org/article/3b0700bbd2204f7282d2176948509caa
Autor:
Inho Seong, Si-jun Kim, Youngseok Lee, Chulhee Cho, Wonnyoung Jeong, Yebin You, Minsu Choi, Byeongyeop Choi, Shinjae You
Publikováno v:
Materials, Vol 16, Iss 8, p 3219 (2023)
Electron temperature has attracted great attention in plasma processing, as it dominates the production of chemical species and energetic ions that impact the processing. Despite having been studied for several decades, the mechanism behind the quenc
Externí odkaz:
https://doaj.org/article/76b4a2a6bafd471a95bd6b8ccc32ad83
Autor:
Si-Jun Kim, Min-Su Choi, Sang-Ho Lee, Won-Nyoung Jeong, Young-Seok Lee, In-Ho Seong, Chul-Hee Cho, Dae-Woong Kim, Shin-Jae You
Publikováno v:
Sensors, Vol 23, Iss 5, p 2521 (2023)
The importance of monitoring the electron density uniformity of plasma has attracted significant attention in material processing, with the goal of improving production yield. This paper presents a non-invasive microwave probe for in-situ monitoring
Externí odkaz:
https://doaj.org/article/529c4a8337e847e3ba60023453870fb4
Autor:
Ye-Bin You, Young-Seok Lee, Si-Jun Kim, Chul-Hee Cho, In-Ho Seong, Won-Nyoung Jeong, Min-Su Choi, Shin-Jae You
Publikováno v:
Nanomaterials, Vol 12, Iss 21, p 3798 (2022)
One of the cleaning processes in semiconductor fabrication is the ashing process using oxygen plasma, which has been normally used N2 gas as additive gas to increase the ashing rate, and it is known that the ashing rate is strongly related to the con
Externí odkaz:
https://doaj.org/article/045575d698d647b4aec66124a4abaf1e
Autor:
Si-jun Kim, In-ho Seong, Young-seok Lee, Chul-hee Cho, Won-nyoung Jeong, Ye-bin You, Jang-jae Lee, Shin-jae You
Publikováno v:
Sensors, Vol 22, Iss 15, p 5871 (2022)
As the conventional voltage and current (VI) probes widely used in plasma diagnostics have separate voltage and current sensors, crosstalk between the sensors leads to degradation of measurement linearity, which is related to practical accuracy. Here
Externí odkaz:
https://doaj.org/article/932ea57d62c34382adf6f1854152c408
Autor:
Si-jun Kim, Sang-ho Lee, Ye-bin You, Young-seok Lee, In-ho Seong, Chul-hee Cho, Jang-jae Lee, Shin-jae You
Publikováno v:
Sensors, Vol 22, Iss 15, p 5487 (2022)
As the importance of measuring electron density has become more significant in the material fabrication industry, various related plasma monitoring tools have been introduced. In this paper, the development of a microwave probe, called the measuremen
Externí odkaz:
https://doaj.org/article/a3833db2845441578bf753d363b77064
Autor:
Min-Su Choi, Si-Jun Kim, Young-Seok Lee, Chul-Hee Cho, In-Ho Seong, Won-Nyoung Jeong, Ye-Bin You, Byoung-Yeop Choi, You-Bin Seol, Shin Jae You
Publikováno v:
Applied Science and Convergence Technology. 32:54-57
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e5d377d3e8250846f90f3ec9d1094178
https://doi.org/10.5757/asct.2023.32.2.54
https://doi.org/10.5757/asct.2023.32.2.54
Publikováno v:
Sensors, Vol 22, Iss 3, p 1291 (2022)
Although the recently developed cutoff probe is a promising tool to precisely infer plasma electron density by measuring the cutoff frequency (fcutoff) in the S21 spectrum, it is currently only applicable to low-pressure plasma diagnostics below seve
Externí odkaz:
https://doaj.org/article/43f621503c5d41f6a2f4c467b7166ea2
Autor:
Ye-Bin You, Si-Jun Kim, Young-Seok Lee, Chul-Hee Cho, In-Ho Seong, Won-Nyoung Jeong, Min-Su Choi, Byoung-Yeop Choi, Shin-Jae You
Publikováno v:
Applied Science and Convergence Technology. 31:103-106
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6180f278eebb9c674066941c457a3e3b
https://doi.org/10.5757/asct.2022.31.5.103
https://doi.org/10.5757/asct.2022.31.5.103
Publikováno v:
Current Applied Physics. 39:289-295
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::50ecf222c53f0a4ec663f537365c5cb1
https://doi.org/10.1016/j.cap.2022.05.011
https://doi.org/10.1016/j.cap.2022.05.011