Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Shyam S. Venkataraman"'
Publikováno v:
Journal of The Electrochemical Society. 161:C138-C144
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7faf2be88a4f1eafa60f036d436678fb
https://doi.org/10.1149/2.093403jes
https://doi.org/10.1149/2.093403jes
Publikováno v:
Chemical communications (Cambridge, England). 52(33)
High-quality graphene oxide (GO) with high crystallinity and electrical conductivity as well as in situ doped with nitrogen and sulfur is obtained via the electrochemical exfoliation of graphite. Furthermore, iron incorporated GO sheets show promisin
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::303702ca3938bc999cb50ea732fad7ca
https://pubmed.ncbi.nlm.nih.gov/27040326
https://pubmed.ncbi.nlm.nih.gov/27040326
Publikováno v:
Journal of The Electrochemical Society. 157:H312
Chemical mechanical polishing (CMP) pads are generally designed to play a passive role in terms of chemical reactions that occur on the surface to be polished. For copper CMP, a pad that is capable of initiating and controlling various chemical react
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8f50d25a3d66e20e548cbd2cc07f5842
https://doi.org/10.1149/1.3276059
https://doi.org/10.1149/1.3276059
Autor:
Shyam S Venkataraman, Yuzhuo Li
Publikováno v:
ECS Meeting Abstracts. :24-24
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4d9ccd91d1a4350aacc244e4af7643d9
https://doi.org/10.1149/ma2008-01/1/24
https://doi.org/10.1149/ma2008-01/1/24
Autor:
Shyam S Venkataraman, Yuzhuo Li
Publikováno v:
ECS Meeting Abstracts. :687-687
not Available.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::be71dca45e42631080d3b44b594cee98
https://doi.org/10.1149/ma2008-01/17/687
https://doi.org/10.1149/ma2008-01/17/687