Výsledky vyhledávání - "Shuzo Ohshio"

Practical study on the electron-beam-only alignment strategy for the electron beam direct writing technology

Autor: Yasushi Takahashi, Shinji Sugatani, Shuzo Ohshio, Jun-ichi Kon, Yoshinori Kojima

Publikováno v: Alternative Lithographic Technologies V.

Techniques to introduce of electron beam direct writing (EBDW) technology into the volume production lines for the 65 nm process technology are shown and discussed. In order to apply these techniques in a harmonious way, partial modifications to the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9dc71922813783cf76aa683634868db1
https://doi.org/10.1117/12.2011628

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Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond

Autor: Yoshinori Kojima, Masaki Takakuwa, Hiromi Hoshino, Ryo Tujimura, Jun-ichi Kon, Yoshio Ito, Yasushi Takahashi, Shinji Sugatani, Shuzo Ohshio, Hiroshi Takita, Masaaki Miyajima, Kozo Ogino

Publikováno v: Alternative Lithographic Technologies IV.

Techniques to appropriately control the key factors for a character projection (CP) based electron beam direct writing (EBDW) technology for mass production are shown and discussed. In order to achieve accurate CD control, the CP technique using the

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b65e6d47d0ba913924817be63ec2dbbb
https://doi.org/10.1117/12.916338

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Feasibility study of character projection-based electron-beam direct writing for logic LSI wiring including automatically routed area with 14nm node technology case

Autor: Yoshinori Kojima, Yasushi Takahashi, Masaki Takakuwa, Shuzo Ohshio, Shinji Sugatani, Takashi Maruyama, Masaru Ito

Publikováno v: Alternative Lithographic Technologies IV.

Multi column cell (MCC) exposure system is a promising candidate for the next generation lithography tool. The concept of MCC is parallelization of the electron beam columns with character projection (CP) [1]. In this paper, we would like to describe

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::b7dcd58a869fe4a9b7c7b6a1461d374e
https://doi.org/10.1117/12.916358

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Study of device mass production capability of the character projection based electron beam direct writing process technology toward 14 nm node and beyond

Autor: Ryo Tujimura, Yoshio Ito, Shuzo Ohshio, Masaaki Miyajima, Hiromi Hoshino, Shinji Sugatani, Yasushi Takahashi, Hiroshi Takita, Yoshinori Kojima, Masaki Takakuwa, Jun-ichi Kon, Kozo Ogino

Publikováno v: Journal of Micro/Nanolithography, MEMS, and MOEMS. 11:031403

Techniques to appropriately control the key factors for a character projection (CP) based electron beam direct writing technology for mass production are shown and discussed. In order to achieve accurate CD control, the CP technique using the master

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::7d50616922ee7679bd9c18a0cf865797
https://doi.org/10.1117/1.jmm.11.3.031403

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