Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Shunpei, Kawai"'
Publikováno v:
Scientific Reports
Scientific Reports, Vol 10, Iss 1, Pp 1-8 (2020)
Scientific Reports, Vol 10, Iss 1, Pp 1-8 (2020)
Dimer radical ions of aromatic molecules in which excess charge is localized in a pair of rings have been extensively investigated. While dimer radical cations of aromatics have been previously produced in the condensed phase, the number of molecules
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e029a61ff8f650ac4ed078bdcf0d073d
https://doi.org/10.1038/s41598-020-76907-4
https://doi.org/10.1038/s41598-020-76907-4
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
Introduction of EUV lithography using soft X-ray at wavelength of 13.5 nm has been started because of demand for miniaturization at low cost in mass production of semiconductor devices. Chemically amplified resist (CAR) has been utilized for many yea
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14e049eb4506f769425e0752d93ac04e
https://doi.org/10.1117/12.2551865
https://doi.org/10.1117/12.2551865
Autor:
Koki Ueno, Kazumasa Okamoto, Yuichi Inubushi, Takahiro Kozawa, Shunpei Kawai, Akira Kon, Hiroo Kinoshita, Shigeki Owada, Yuta Ikari, Thanh-Hung Dinh, Yohei Arai, Masahiko Ishino, Akihiro Konda, Masaharu Nishikino, Shigeo Hori
Publikováno v:
Applied Physics Express. 14:066502
Efforts are being focused on increasing the power of extreme ultraviolet (EUV) light sources used in semiconductor manufacturing to increase the throughput. As a result, the investigation of the effect of high power sources on resist materials is a c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e9effc818f8e5b6eaa00f2d4935e71be
https://doi.org/10.35848/1882-0786/abfca3
https://doi.org/10.35848/1882-0786/abfca3
Autor:
Kazumasa, Okamoto, Shunpei, Kawai, Yuta, Ikari, Shigeo, Hori, Akihiro, Konda, Koki, Ueno, Yohei, Arai, Masahiko, Ishino, Dinh, Thanhhung, Masaharu, Nishikino, Akira, Kon, Shigeki, Owada, Yuichi, Inubushi, Hiroo, Kinoshita, Takahiro, Kozawa
Publikováno v:
Applied Physics Express. 14:066502
Efforts are being focused on increasing the power of EUV light sources used in semiconductor manufacturing to increase the throughput. As a result, the investigation of the effect of high power sources on resist materials is a critical issue. A chemi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=jairo_______::4409df2361d3c0c2c3dfec59ddde7569
https://repo.qst.go.jp/records/82819
https://repo.qst.go.jp/records/82819