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Development and characterization of imprint-resists as masks for plasma etching

Autor: Cardinaud, C., Gaboriau, F., Bousquet, A., Pfeiffer, K., Reuther, F., Fink, M., Grueztner, G., Shultz, H., Scheer, H.C., Sotomayor Torres, C.M., Montelius, L., Mayer, C., Ahopelto, Jouni

Publikováno v: Cardinaud, C, Gaboriau, F, Bousquet, A, Pfeiffer, K, Reuther, F, Fink, M, Grueztner, G, Shultz, H, Scheer, H C, Sotomayor Torres, C M, Montelius, L, Mayer, C & Ahopelto, J 2002, Development and characterization of imprint-resists as masks for plasma etching . in Proceedings of the First International Conference on Nanoimprint Nanoprint Technology, NNT Conference, San Francisco, CA, 11-13 Dec, 2002 . Naval Research Laboratory, San Francisco, pp. 152-153, 1st International Conference on Nanoimprint and Nanoprint Technology, NNT'02, San Francisco, United States, 11/12/02 .

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=355e65625b88::ba37f1b42b64a3957eafce0db0c8b126
https://cris.vtt.fi/en/publications/619f821a-c293-4ba4-87e5-c082aed4e7f3

Preventing lead poisoning in New York City: priorities for lead abatement in housing

Autor: Goodman, A. K., Shultz, H., Klitzman, S., Kimmelblatt, M., Spadaro, W.

The major challenge for lead poisoning prevention programs is to increase the availability of lead-safe housing as quickly as possible. The approach proposed by the City of New York maximizes the impact of the limited resources available to address t

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=pmid________::ca0085771615e6849212e19a66b05b73
https://europepmc.org/articles/PMC2359237/

Department of Defense doctrine and materiel for protecting personnel from biting arthropods.

Autor: Shultz HA, Shultz, H A

Publikováno v: Journal of Travel Medicine; May/Jun2001, Vol. 8 Issue 3, p133-138, 6p

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