Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Shuichiro Ohara"'
Autor:
Shuichiro Ohara, Stanislas Baron, Yasuaki Horima, Yasuko Saito, Been-Der Chen, Chris Spence, Zhang Quan, Vincent Shu, Masakazu Hamaji
Publikováno v:
Photomask Technology.
To achieve the ultimate resolution and process control from an optical (193i 1.35NA) scanner system, it is desirable to be able to exploit both source and mask degrees of freedom to create the imaging conditions for any given set of patterns that com
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::54474f03e670fed3b60b6bdd4ca83024
https://doi.org/10.1117/12.2280470
https://doi.org/10.1117/12.2280470
Autor:
Shuichiro Ohara, Dai Tsunoda, Brian Dillon, Masakazu Hamaji, Vincent Arnoux, Yi-Hsing Peng, Stanislas Baron, Yi Zou, Tomoyuki Muramatsu, Xiaolong Zhang
Publikováno v:
SPIE Proceedings.
Demand for mask process correction (MPC) is growing for leading-edge process nodes. MPC was originally intended to correct CD linearity for narrow assist features difficult to resolve on a photomask without any correction, but it has been extended to
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ffd16ef7c55042c03db782af425c1d31
https://doi.org/10.1117/12.2242972
https://doi.org/10.1117/12.2242972
Autor:
Shuichiro Ohara
Publikováno v:
SPIE Proceedings.
This industry faces new challenges every day. It gets tougher as process nodes shrink and the data complexity and volume increase. We are a mask data preparation (MDP) software provider, and have been providing MDP systems to mask shops since 1990. A
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a17184235a215ad0590462fb27787e19
https://doi.org/10.1117/12.2070163
https://doi.org/10.1117/12.2070163
Publikováno v:
SPIE Proceedings.
Data volume is getting larger every day in Mask Data Preparation (MDP). In the meantime, faster data handling is always required. MDP flow typically introduces Distributed Processing (DP) system to realize the demand because using hundreds of CPU is
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8e6bb9c24cd504418fbce3d11d71fb3b
https://doi.org/10.1117/12.864250
https://doi.org/10.1117/12.864250
Publikováno v:
Japanese Journal of Applied Physics. 44:6644
The ferroelectric properties of metal–ferroelectric–metal (MFM) capacitors with a Pt/Pb5Ge3O11(PGO)/Pt structure and metal–ferroelectric–insulator–semiconductor (MFIS) diodes with a Pt/PGO/HfO2/Si structure were investigated. C-axis-oriente
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::af60c87a1f2d62cb39792bc77aab93d1
https://doi.org/10.1143/jjap.44.6644
https://doi.org/10.1143/jjap.44.6644
Autor:
Vivian Wei Guo, Fan Jiang, Rankin, Jed, Bork, Ingo, Tritchkov, Alexander, Wei, Alexander, Yuyang Sun, Jayaram, Srividya, Larry Zhuang, Xima Zhang, Bailey, Todd, Word, James
Publikováno v:
Proceedings of SPIE; 8/26/2018, Vol. 10810, p108100P-1-108100P-13, 13p
Autor:
Rajagopalan, Archana, Bowhill, Amanda, Buck, Peter, Durvasula, Bhardwaj, Gilgenkrantz, Pascal, Kim, Stephen, Park, Minyoung, Rao, Nageswara, Schulze, Steffen
Publikováno v:
Proceedings of SPIE; 8/26/2018, Vol. 10810, p108100L-1-108100L-8, 8p
Autor:
Shibing Wang, Baron, Stanislas, Kachwala, Nishrin, Kallingal, Chidam, Dezheng Sun, Shu, Vincent, Fong, Weichun, Zero Li, Elsaid, Ahmad, Jin-Wei Gao, Jing Su, Jung-Hoon Ser, Quan Zhang, Been-Der Chen, Howell, Rafael, Hsu, Stephen, Luo, Larry, Yi Zou, Zhang, Gary, Yen-Wen Lu
Publikováno v:
Proceedings of SPIE; 1/15/2018, Vol. 10587, p1-9, 9p
Autor:
Liubich, Vlad, Mizuuchi, Keisuke, Tritchkov, Alexander, Rathi, Ashutosh, Zhang, Xima, Kim, Isabella, Sturtevant, John
Publikováno v:
Proceedings of SPIE; 7/6/2021, Vol. 11855, p118550S-118550S-9, 1p