Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Shuen Chen Chen"'
Autor:
Shih-Wei Chen, Chin-Tien Yang, Rung-Ywan Tsai, Chung-Ta Cheng, Shuen-Chen Chen, Wen-Haw Lu, Chun-Chieh Huang
Publikováno v:
Optical Review. 20:185-188
The application of blue laser lithography for creating antireflective submicron structures on a crystalline silicon substrate was evaluated. The assembled blue laser lithography system was obtained by modifying a commercial blue laser optical pickup
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a11907610fa5892be1c720224873a4d5
https://doi.org/10.1007/s10043-013-0031-4
https://doi.org/10.1007/s10043-013-0031-4
Publikováno v:
IEEE Transactions on Magnetics. 47:701-705
The characterization of novel small size 405 nm blue-laser optical head-like opto-mechanical system for turntable thermal mode lithography system that can provide high quality beam spot profile and real time high precision servo control and feasibili
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d7c17105176341565fc4ee309149483c
https://doi.org/10.1109/tmag.2010.2101585
https://doi.org/10.1109/tmag.2010.2101585
Publikováno v:
2013 Conference on Lasers and Electro-Optics Pacific Rim (CLEOPR).
A dual-wavelength optical head with an NA0.85 objective lens for lithography was developed. Both 405nm and 650nm are integrated in this optical head. It can be used to expose both organic and in-organic photo-resists and meanwhile performing focusing
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1b85df24e416aa0c19dfa94ad50dcc45
https://doi.org/10.1109/cleopr.2013.6600565
https://doi.org/10.1109/cleopr.2013.6600565
Publikováno v:
Sensors & Materials; 2018, Vol. 30 Issue 3,Part 1, p355-363, 9p
Publikováno v:
Supplemental Proceedings: Materials Processing and Interfaces, Volume 1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3635638072b5677fa7a29b02975e5f08
https://doi.org/10.1002/9781118356074.ch84
https://doi.org/10.1002/9781118356074.ch84
Publikováno v:
Nonlinear Optics.
using inorganic photo resist material with composition GeSbSnOx to nanolithrography process ,to fabricate nano honeycomb structure .The reflectance of the nanostructure in near visible light is 8~13%
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::122053d5439c91ff21847d507c9d1c97
https://doi.org/10.1364/isom_ods.2011.otud18
https://doi.org/10.1364/isom_ods.2011.otud18
Publikováno v:
Nonlinear Optics.
In this study, we report on use the thermal lithography technology to prepare the submicron structure for antireflection application.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e09ae77e779de55a91cf28346e21a29c
https://doi.org/10.1364/isom_ods.2011.omd21
https://doi.org/10.1364/isom_ods.2011.omd21