Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Shraddha Supreeti"'
Autor:
Ralf Schienbein, Florian Fern, Stefan Sinzinger, Shraddha Supreeti, Patrick Feßer, Martin Hoffmann
Publikováno v:
Nanomanufacturing and Metrology. 4:175-180
Uniform molding and demolding of structures on highly curved surfaces through conformal contact is a crucial yet often-overlooked aspect of nanoimprint lithography (NIL). This study describes the development of a NIL tool and its integration into a n
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f60de4926dae9b6f0feb2b7462a0492b
https://doi.org/10.1007/s41871-021-00114-6
https://doi.org/10.1007/s41871-021-00114-6
Autor:
Oliver Dannberg, Andreas Meister, Stephan Gorges, Tino Hausotte, Xinrui Cao, Taras Sasiuk, Ivo W. Rangelow, Johannes Kirchner, Johann Reger, Laura Mohr-Weidenfeller, Christoph Reuter, Stefan Sinzinger, Lena Zentner, Steffen Strehle, Roland Füßl, Eberhard Manske, Jaqueline Stauffenberg, Martin Hofmann, David Fischer, Ralf Schienbein, René Theska, Carsten Reinhardt, Shraddha Supreeti, Florian Fern, Thomas Fröhlich, Christoph Weise, Christoph Dr. Schäffel, Jens-Peter Zöllner, Ingo Ortlepp
Publikováno v:
Nanomanufacturing and Metrology. 4:132-148
The field of optical lithography is subject to intense research and has gained enormous improvement. However, the effort necessary for creating structures at the size of 20 nm and below is considerable using conventional technologies. This effort and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a5d9ced3f7ff818a334a8e047dd61d2a
https://doi.org/10.1007/s41871-021-00110-w
https://doi.org/10.1007/s41871-021-00110-w
Publikováno v:
Nanomanufacturing and Metrology. 4:156-164
The majority of nanopositioning and nanomeasuring machines (NPMMs) are based on three independent linear movements in a Cartesian coordinate system. This in combination with the specific nature of sensors and tools limits the addressable part geometr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2b47741795b0e5986f5347aef0162b02
https://doi.org/10.1007/s41871-021-00102-w
https://doi.org/10.1007/s41871-021-00102-w
Publikováno v:
Nanomanufacturing and Metrology. 5:437-437
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::59bda57162ff291341e376a1038551e9
https://doi.org/10.1007/s41871-022-00162-6
https://doi.org/10.1007/s41871-022-00162-6
Autor:
Ingo Ortlepp, Ivo W. Rangelow, Thomas Michels, Shraddha Supreeti, Johannes Kirchner, Laura Weidenfeller, Denis Dontsov, Christoph Dr. Schäffel, Eberhard Manske, Thomas Fröhlich, Martin Hofmann, Rostyslav Mastylo, Mathias Holz, Michael Kühnel, Roland Füßl
Publikováno v:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020.
Although the field of optical lithography is highly investigated and numerous improvements are made, structure sizes smaller than 20 nm can only be achieved by considerable effort when using conventional technology. To cover the upcoming tasks in fut
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::986ca9502df09dd4a1e70f679ed1da2e
https://doi.org/10.1117/12.2551044
https://doi.org/10.1117/12.2551044
Autor:
Stefan Sinzinger, Ivo W. Rangelow, Martin Hofmann, Eberhard Manske, Shraddha Supreeti, Johannes Kirchner, Laura Weidenfeller
Publikováno v:
Optical Measurement Systems for Industrial Inspection XI.
To keep up with Moore’s law in future, the critical dimensions of device features must further decrease in size. Thus, the nano-electronics and nano-optics manufacturing is based on the ongoing development of the lithography and encompasses also so
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8baa6dc2f724fb05bd08196437415c47
https://doi.org/10.1117/12.2528136
https://doi.org/10.1117/12.2528136
Autor:
Stefan Sinzinger, Martin Hofmann, Ivo W. Rangelow, Rostyslav Mastylo, Shraddha Supreeti, Eberhard Manske, Martin Hoffmann, Johannes Kirchner
Publikováno v:
Novel Patterning Technologies for Semiconductors, MEMS/NEMS, and MOEMS 2019.
Imprinting micro- and nanostructures on non-planar surfaces has gained prominence in various fields such as optoelectronics, photonics and biomedical implants. It has been implemented for applications such as optical sensor arrays and optical fibers.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fe47aa7c3f7c6ad0922a10de74ace49b
https://doi.org/10.1117/12.2514832
https://doi.org/10.1117/12.2514832
Autor:
Ivo W. Rangelow, Christoph Reuter, Stephan Mechold, Eberhard Manske, Mathias Holz, Shraddha Supreeti, Laura Weidenfeller, Martin Hofmann
Publikováno v:
Microelectronic Engineering. 227:111325
A Mix-and-Match lithography method for a high-resolution, high-precision and cost effective lithography tool using DLW and FE-SPL was developed and successfully realized. The pattern transfer from the photoresist to the silicon substrate is done by s
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::554b2edeb75e09635eec0d6ce3eb68cf
https://doi.org/10.1016/j.mee.2020.111325
https://doi.org/10.1016/j.mee.2020.111325
Autor:
Ivo W. Rangelow, Eberhard Manske, Laura Weidenfeller, Christoph Reuter, Mathias Holz, Stefan Sinzinger, Martin Hofmann, Shraddha Supreeti, Stephan Mechold
Publikováno v:
Microelectronic Engineering. 224:111234
Field Emission Scanning Probe Lithography (FE-SPL) is an enabling technology for prototyping of sub-10 nm high-performance electronic devices. However, due to the serial writing scheme this technology is rather slow. The purpose of this work is the d
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0b16976fad21ae235837a74658463d50
https://doi.org/10.1016/j.mee.2020.111234
https://doi.org/10.1016/j.mee.2020.111234