Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Shouhei Yamauchi"'
Autor:
Masatoshi Yamato, Kenichi Oyama, Arisa Hara, Sakurako Natori, Hidetami Yaegashi, Kyohei Koike, Shouhei Yamauchi, Kazuki Yamada
Publikováno v:
SPIE Proceedings.
Lithographic scaling continues to advance by extending the life of 193nm immersion technology, and spacer-type multi-patterning is undeniably the driving force behind this trend. Multi-patterning techniques such as self-aligned double patterning (SAD
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ab0dc7198d254ddb1118c5657b8bb547
https://doi.org/10.1117/12.2258154
https://doi.org/10.1117/12.2258154
Autor:
Masatoshi Yamato, Kyohei Koike, Kenichi Oyama, Sakurako Natori, Hidetami Yaegashi, Shouhei Yamauchi, Noriaki Okabe, Arisa Hara
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
Through the continuous scaling with extension of 193-immersion lithography, the multi-patterning process with the grid-based design has become nominal process for fine fabrication to relax tight pitch designs [1] . In self-aligned type multiple patte
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::78828705c7c5aa86f5605bd3bf79d770
https://doi.org/10.1117/12.2085765
https://doi.org/10.1117/12.2085765