Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Shota Umeda"'
Autor:
Ryoma Honda, Kazuyasu Fujii, Youhei Uchida, Aya Takeda, Shota Umeda, Tadashi Umehara, Takuro Kanekura
Publikováno v:
Journal of Cutaneous Immunology and Allergy, Vol 4, Iss 4, Pp 95-96 (2021)
Externí odkaz:
https://doaj.org/article/ff05807055ca407aac88b48d6467122a
Planned Maintenance Schedule Update Method for Predictive Maintenance of Semiconductor Plasma Etcher
Publikováno v:
IEEE Transactions on Semiconductor Manufacturing. 34:296-300
In a semiconductor plasma etcher, it is becoming increasingly necessary to improve productivity by reducing unplanned equipment maintenance. Thus, predictive maintenance (PdM) is typically conducted using equipment data to predict the failure timing,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f8528dfca627cbd55e6224931426fbb3
https://doi.org/10.1109/tsm.2021.3071487
https://doi.org/10.1109/tsm.2021.3071487
Autor:
Masayuki, Chida, Shota, Umeda, Kenji, Aruga, Yuki, Yazaki, Tomomi, Imamura, Kazushi, Magara, Motohiko, Tamura, Nao, Inoue, Osamu, Araki, Takahiro, Nakajima, Satoru, Kobayashi, Sumiko, Maeda
Publikováno v:
Kyobu geka. The Japanese journal of thoracic surgery. 75(4)
The number of lung transplantation performed in Japan is extremely low compared to other countries, whereas we have 10 facilities certified as cadaveric lung transplantation in Japan, meaning that there are low volume centers. By August 2021, we perf
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=pmid________::068938ea75dc76ca5c01fc0880835330
https://pubmed.ncbi.nlm.nih.gov/35342162
https://pubmed.ncbi.nlm.nih.gov/35342162
Autor:
Kazuyasu Fujii, Aya Takeda, Tadashi Umehara, Youhei Uchida, Shota Umeda, Takuro Kanekura, Ryoma Honda
Publikováno v:
Journal of Cutaneous Immunology and Allergy, Vol 4, Iss 4, Pp 95-96 (2021)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::7a1e732783a8604879e33cefd92ddf2d
https://doaj.org/article/ff05807055ca407aac88b48d6467122a
https://doaj.org/article/ff05807055ca407aac88b48d6467122a
Publikováno v:
2018 International Symposium on Semiconductor Manufacturing (ISSM).
In the semiconductor, an advanced process control (APC) system using virtual metrology (VM) for plasma etching is required to achieve further device miniaturization. VM is a method to predict process outputs such as the critical dimension (CD) from e
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6c6f1de0cb34907145e32eeca705311f
https://doi.org/10.1109/issm.2018.8651162
https://doi.org/10.1109/issm.2018.8651162
Autor:
Shota Umeda, Kazuyoshi Fushinobu
Publikováno v:
The Proceedings of the Thermal Engineering Conference. 2015:D214-1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d10b136e94f3de5b19b5b6a3cce26b33
https://doi.org/10.1299/jsmeted.2015._d214-1_
https://doi.org/10.1299/jsmeted.2015._d214-1_