Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Shohei Koshiba"'
Publikováno v:
SHINKU. 35:335-337
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::16f52d2b404576793cc502935a234e79
https://doi.org/10.3131/jvsj.35.335
https://doi.org/10.3131/jvsj.35.335
Autor:
Yoshio Ishihara, Shohei Koshiba
Publikováno v:
SHINKU. 34:553-555
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2be01f3882b7352dfe916eeff9af9f48
https://doi.org/10.3131/jvsj.34.553
https://doi.org/10.3131/jvsj.34.553
Publikováno v:
Japanese Journal of Applied Physics. 30:L1974
Penta-di-methyl-amino-tantalum (Ta[N(CH3)2]5), a new source chemical of Ta in TaO chemical vapor deposition (CVD), has been studied. TG and DTA measurements show that Ta[N(CH3)2]5 is chemically stable up to about 150°C and vaporizes at a temperature
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ef07790a51435e286e11bb3fdae457ed
https://doi.org/10.1143/jjap.30.l1974
https://doi.org/10.1143/jjap.30.l1974
Autor:
Shohei Koshiba, Kenji Higashiyama, Naoki Wada, Takayuki Yuasa, Yoshihiro Shintani, Kunimasa Uematsu, Shiro Sakai, Masayoshi Umeno, Yoshihiro Ueta
Publikováno v:
Japanese Journal of Applied Physics. 30:L396
A reactor for metalorganic chemical vapor deposition is newly developed. The reactor has an internal flow selector by which two out of four continuously flowing gases are selected. The gas switching is performed just by rotating the flow selector wit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b5c5215f6c4913f4dc5cdfa7b9a81c73
https://doi.org/10.1143/jjap.30.l396
https://doi.org/10.1143/jjap.30.l396
Autor:
Tabuchi, Toshiya, Sawado, Yoshinori, Kunimasa Uematsu, Kunimasa Uematsu, Shohei Koshiba, Shohei Koshiba
Publikováno v:
Japanese Journal of Applied Physics; November 1991, Vol. 30 Issue: 11 pL1974-L1974, 1p
Akademický článek
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