Zobrazeno 1 - 10
of 23
pro vyhledávání: '"Shinya Yoshidomi"'
Publikováno v:
Applied Physics A. 116:2113-2118
We report connection conductivity ( $$C_{\rm c}$$ ) of adhesive which including $$\hbox {In}_2\hbox {O}_3$$ – $$\hbox {SnO}_2$$ (ITO) particles developed for fabrication of stacked-type-multi-junction solar cells. The commercial 20- $$\upmu $$ m si
Publikováno v:
Energy Procedia. 60:116-122
We report a mechanical stacking technology with transparent conductive adhesive as intermediate conductive layer for multi-junction-solar cells. Transparent adhesive jell dispersed with Indium-Tin-Oxide (ITO) particles ranging from 5 to 10 wt% was de
Publikováno v:
MRS Proceedings. 1426:289-294
We report formation of thin silicon oxide films on the silicon surfaces by combination of oxygen radical and high pressure H2O vapor heat treatment for passivation of silicon surfaces at a low temperature. Oxygen plasma was generated by 13.56 MHz rad
Publikováno v:
MRS Proceedings. 1426:421-426
We report formation of thin aluminum oxide AlOx films on the silicon surface by a simple method of Al metal evaporation in oxygen gas atmosphere. 520 μm thick 30-Ωcm p-type-silicon substrates with a top bare surface and a rear surface coated with 1
Publikováno v:
MRS Proceedings. 1426:353-358
Change in the light-induced minority carrier effective lifetime τeff of crystalline silicon caused by rapid laser heating is reported. The top surface of n- and p-type silicon substrates with thicknesses of 520 μm coated with thermally grown SiO2 l
Autor:
Shin Yokohama, N. Sano, Toshiyuki Sameshima, T. Haba, Masahiko Hasumi, Shinya Yoshidomi, Kazuya Kogure
Publikováno v:
Journal of Laser Micro/Nanoengineering. 4:227-230
*** We report the crystallization of 40-nm-thick hydrogenated amorphous silicon films using 940nm continuous wave infrared semiconductor laser with 200 nm diameter carbon particles as photo absorption. The laser beam was focused to 100 μm diameter a
Publikováno v:
2015 22nd International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD).
We propose a method of reduction in optical reflection loss by transparent conductive Indium Gallium Zinc Oxide (IGZO) for the purpose of fabricating mechanical stacked solar cells. Si and Ge substrates coated with 200 nm thick 0.058 Ωcm IGZO layer
Publikováno v:
2014 21st International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD).
We report passivation on the silicon surfaces by combination of oxygen radical and high pressure H 2 O vapor heat treatment. The top bear surface of 20 Ωcm n-type silicon substrates with the rear surface coated by 100 nm thermally grown SiO 2 layers
Passivation of silicon surfaces by heat treatment in boiled water and its application of solar cells
Publikováno v:
2014 21st International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD).
Publikováno v:
2014 21st International Workshop on Active-Matrix Flatpanel Displays and Devices (AM-FPD).
We report decrease in reflection loss at the intermediate adhesive layer for mechanical-stack-multi-junction solar cells by increasing the refractive index of the intermediate adhesive layer. Samples of self-standing films of 30-nm-TiO 2 -particle di