Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Shinya Kiriu"'
Autor:
Johann Michler, Hiroyuki Miyazoe, Hirokazu Kikuchi, Kazuo Terashima, Ivo Utke, Shinya Kiriu, Vinzenz Friedli
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 28:744-750
Local coinjection of a (H2–Ar) microplasma jet and Cu(O2C5F6H)2 molecules during focused electron beam-induced deposition (FEBID) was studied with respect to changes in the Cu:C ratio of deposits. Microplasma-assisted FEBID (30 keV and 1 nA) decrea
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::838dadedcdb91b4ee7c09819cc1ccbf6
https://doi.org/10.1116/1.3449808
https://doi.org/10.1116/1.3449808
Autor:
Hiroyuki Miyazoe, Jai Hyuk Choi, Masaki Sai, Kazuo Terashima, Takaaki Tomai, Shinya Kiriu, Fumitoshi Takamine
Publikováno v:
Applied Physics Letters. 94:191502
A low-power ultrahigh-frequency-driven inductively coupled microplasma (ICMP) source equipped with dielectric-barrier discharge (DBD) was developed to realize a low-temperature and high-density plasma in fine quartz capillaries with inner diameters o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c250667bec14915c24d9084a21fb9182
https://doi.org/10.1063/1.3130183
https://doi.org/10.1063/1.3130183