Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Shinya Kiriu"'
Autor:
Johann Michler, Hiroyuki Miyazoe, Hirokazu Kikuchi, Kazuo Terashima, Ivo Utke, Shinya Kiriu, Vinzenz Friedli
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 28:744-750
Local coinjection of a (H2–Ar) microplasma jet and Cu(O2C5F6H)2 molecules during focused electron beam-induced deposition (FEBID) was studied with respect to changes in the Cu:C ratio of deposits. Microplasma-assisted FEBID (30 keV and 1 nA) decrea
Autor:
Hiroyuki Miyazoe, Jai Hyuk Choi, Masaki Sai, Kazuo Terashima, Takaaki Tomai, Shinya Kiriu, Fumitoshi Takamine
Publikováno v:
Applied Physics Letters. 94:191502
A low-power ultrahigh-frequency-driven inductively coupled microplasma (ICMP) source equipped with dielectric-barrier discharge (DBD) was developed to realize a low-temperature and high-density plasma in fine quartz capillaries with inner diameters o
Publikováno v:
2004 47th Midwest Symposium on Circuits & Systems, 2004 (MWSCAS '04); 2004, pxxvi-lii, 27p
Autor:
Miyazoe, Hiroyuki, Utke, Ivo, Kikuchi, Hirokazu, Kiriu, Shinya, Friedli, Vinzenz, Michler, Johann, Terashima, Kazuo
Publikováno v:
Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Jul2010, Vol. 28 Issue 4, p744-750, 7p, 5 Diagrams, 2 Charts, 3 Graphs
Autor:
Kiriu, Shinya, Miyazoe, Hiroyuki, Takamine, Fumitoshi, Sai, Masaki, Jai Hyuk Choi, Tomai, Takaaki, Terashima, Kazuo
Publikováno v:
Applied Physics Letters; 5/11/2009, Vol. 94 Issue 19, p191502, 3p, 3 Diagrams, 2 Graphs
Publikováno v:
2004 47th Midwest Symposium on Circuits & Systems, 2004 (MWSCAS '04); 2004, pliii-liii, 1p