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Autor:
Shinji Yanaga, Munehiro Ogasawara, Kiminobu Akeno, Noboru Kobayashi, Shinsuke Nishimura, Mitsuko Shimizu, Toru Tojo, Ryuji Hayashi, Soichiro Mitsui, Hideo Kusakabe
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 20:2640
Mask-scan strategy for writing large complex patterns such as oblique lines and contact holes with assist bar and serif is more effective for decreasing the number of shots than is variable shaped beam (VSB) strategy and character projection strategy