Zobrazeno 1 - 10
of 46
pro vyhledávání: '"Shinji Yamakawa"'
Publikováno v:
Journal of Photopolymer Science and Technology. 35:61-65
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dfe0f035d0e2700ab44f3078ae5c268b
https://doi.org/10.2494/photopolymer.35.61
https://doi.org/10.2494/photopolymer.35.61
Publikováno v:
Journal of Photopolymer Science and Technology. 35:55-59
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3c6c5aa9ecede9c5eeef907b79910ccd
https://doi.org/10.2494/photopolymer.35.55
https://doi.org/10.2494/photopolymer.35.55
Autor:
Yosuke Ohta, Atsushi Sekiguchi, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe, Hiroki Yamamoto
Publikováno v:
Journal of Photopolymer Science and Technology. 35:49-54
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30007f08ae611256d6b41d9b55ab1f82
https://doi.org/10.2494/photopolymer.35.49
https://doi.org/10.2494/photopolymer.35.49
Publikováno v:
Journal of Photopolymer Science and Technology. 34:111-115
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cdd8a02993d0e03be0b920c821f5c715
https://doi.org/10.2494/photopolymer.34.111
https://doi.org/10.2494/photopolymer.34.111
Publikováno v:
Journal of Photopolymer Science and Technology. 34:49-53
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::27b9c9b38bf205d53db8361b859a8b06
https://doi.org/10.2494/photopolymer.34.49
https://doi.org/10.2494/photopolymer.34.49
Autor:
Takahiro Kozawa, Shinji Yamakawa, Mari Fukunaga, Hiroki Yamamoto, Teppei Yamada, Kazumasa Okamoto, Takeo Watanabe, Hiroto Kudo
Publikováno v:
Journal of Photopolymer Science and Technology. 32:805-810
We examined the synthesis and resist properties of tellurium-containing molecular resist materials. By the condensation reaction of anisol, phenol, and 2-phenylphenol with tellurium tetrachloride (TeCl4), dichloro di(4-hydroxyphenyl) telluride (CHPT)
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::abdfa04cdf4dcc2ac99b96cb1f61e139
https://doi.org/10.2494/photopolymer.32.805
https://doi.org/10.2494/photopolymer.32.805
Publikováno v:
Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::11b40777f6425b5bcdde2a764d12af71
https://doi.org/10.1117/12.2601080
https://doi.org/10.1117/12.2601080
Publikováno v:
Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d3ab24ecbbc04f04b0e10dd6f0324115
https://doi.org/10.1117/12.2600896
https://doi.org/10.1117/12.2600896
Publikováno v:
Reactive and Functional Polymers. 136:19-24
(bpy)NiBr2 catalyzes the copolymerization of butadiene and norbornene (56:44) in the presence of methylaluminoxane at 30 °C. 1H NMR spectrum of the copolymer contains signals of norbornene units and 1,4-butadiene units and shows the molar ratio of t
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2464dc9b97ffd559bfed2d8e568b5604
https://doi.org/10.1016/j.reactfunctpolym.2018.12.006
https://doi.org/10.1016/j.reactfunctpolym.2018.12.006
Publikováno v:
Japanese Journal of Applied Physics. 60:087005
Extreme ultraviolet (EUV) lithography has recently been utilized as a high-volume manufacturing technology for advanced semiconductors. An EUV mirror can be easily contaminated in the existence of a residual hydrocarbon vapor gas inside an exposure c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::51f6e7d6a808ff806eb2602b3f209d52
https://doi.org/10.35848/1347-4065/ac15ef
https://doi.org/10.35848/1347-4065/ac15ef