Zobrazeno 1 - 10 of 54 pro vyhledávání: '"Shinji Tarutani"'
2
(Invited) Negative Tone Development Process and Resist Materials with ArF Immersion Exposure Process
Autor: Shinji Tarutani
Publikováno v: ECS Transactions. 52:239-244
Negative tone development (NTD) process was proposed as a good candidate to obtain good quality in resist pattern for trench and contact hole (C/H) pattern with ArF immersion resist process. Advantages of NTD compared to positive tone development (PT
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::909bc0dfe7641db85562ada2a2c113eb
https://doi.org/10.1149/05201.0239ecst
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3
Negative Tone Imaging Process and Materials for EUV Lithography
Autor: Wataru Nihashi, Shuuji Hirano, Shinji Tarutani, Natsumi Yokokawa, Hiroo Takizawa
Publikováno v: Journal of Photopolymer Science and Technology. 26:599-604
The advantages of NTI process in EUV is demonstrated by optical simulation method for 0.25NA and 0.33NA illumination system with view point of optical aerial image quality and photon density. The extendabLlity of NTI for h igher NA system is consider
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e8d07f6f0137dcafe2f116cf09ae83d7
https://doi.org/10.2494/photopolymer.26.599
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5
Functional Resist Materials for Negative Tone Development in Advanced Lithography
Autor: Kaoru Iwato, Shinji Tarutani, Kei Yamamoto, Kana Fujii, Shirakawa Michihiro
Publikováno v: Journal of Photopolymer Science and Technology. 25:109-114
Challenges of lithography performance, dry etch resistance, and substrate dependency in resist materials dedicated to negative tone development (NTD) process were studied. The gamma-parameter in contrast curve was increased to achieve improvement in
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::774b0bdae65fb5fc393c92b3f784e708
https://doi.org/10.2494/photopolymer.25.109
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7
Characterizing Polymer bound PAG Type EUV Resist
Autor: Hidenori Takahashi, Su-Jin Kang, Hiroo Takizawa, Shinji Tarutani, Toshiya Takahashi, Hideaki Tsubaki, Hiroshi Tamaoki
Publikováno v: Journal of Photopolymer Science and Technology. 24:185-191
Blurs, swelling properties and lithographic performance for polymer bound PAG and polymer PAG blended type resists were studied. A Blur strongly depends on PAG size and the polymer bound PAG type resist reduces the Blur. The Blur for the polymer boun
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::bd276ff0b6fdf7ad04ab3dd59e3e9958
https://doi.org/10.2494/photopolymer.24.185
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9
Materials and Processes of Negative Tone Development for Double Patterning Process
Autor: Sou Kamimura, Hideaki Tsubaki, Shinji Tarutani
Publikováno v: Journal of Photopolymer Science and Technology. 22:635-640
A new negative tone imaging with application of new developer to conventional ArF immersion resist materials is proposed to form narrow trench and contact hole patterns, which is promising for double patterning process, since it is difficult to obtai
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::6186a52840168487f4d1ac3d655d09c6
https://doi.org/10.2494/photopolymer.22.635
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10
Development of Materials and Processes for Double Patterning toward 32nm Node ArF Immersion Lithography
Autor: Shinichi Kanna, Shinji Tarutani, Hideaki Tsubaki
Publikováno v: Journal of Photopolymer Science and Technology. 21:685-690
A new negative tone imaging with application of new developer to conventional ArF immersion resist materials is proposed for narrow trench pattern formation, which is effective to the double trench process that is one of the candidates of double patt
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9a12c0d48ba8c20f54238aba03ff96e0
https://doi.org/10.2494/photopolymer.21.685
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