Zobrazeno 1 - 1
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pro vyhledávání: '"Shinji Nakasato"'
Publikováno v:
Microelectronic Engineering. 84:705-710
We demonstrate a prototype of the near-field lithography system, which is a potential tool for low cost nano-fabrication. Resist patterns with 50nm features are fabricated on the entire surface of a 4-in. silicon wafer by step and repeat exposure usi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::61ebea5c2a272b5e68019cf10d04aca0
https://doi.org/10.1016/j.mee.2007.01.043
https://doi.org/10.1016/j.mee.2007.01.043
