Zobrazeno 1 - 10
of 12
pro vyhledávání: '"Shinichiro Nohdo"'
Publikováno v:
Journal of the Physical Society of Japan. 66:3733-3736
The charge ordering process of a mixed valence LuFe 2 O 4 system has been studied, focusing attention on the frustration effect associated with the charge configuration. It is revealed that the system undergoes successive phase transitions following
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b042d90c2e0786eaee99640690de736b
https://doi.org/10.1143/jpsj.66.3733
https://doi.org/10.1143/jpsj.66.3733
Publikováno v:
Physical Review Letters. 77:904-907
We have found a polaron ordered phase in low-doping rate ${\mathrm{La}}_{1\ensuremath{-}x}{\mathrm{Sr}}_{x}{\mathrm{MnO}}_{3}$ ( $x\phantom{\rule{0ex}{0ex}}=\phantom{\rule{0ex}{0ex}}0.10$ and 0.15) by neutron scattering study. The onset temperature o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::498a039433dde40ebb51c112a1189387
https://doi.org/10.1103/physrevlett.77.904
https://doi.org/10.1103/physrevlett.77.904
Autor:
Kazuhisa Kakurai, Noriaki Horiuchi, Rinna Kanao, Shinichiro Nohdo, Shoji Kashida, Yasusada Yamada
Publikováno v:
Journal of the Physical Society of Japan. 64:2286-2289
The phase transition mechanism of KDCO 3 crystal composed of hydrogen-bonded (DCO 3 ) 2 -dimers has been studied by neutron scattering. Strong quasielastic diffuse scattering is observed above T c . From detailed analysis of the intensity distributio
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d5b08a16787b9533aac8e97bd0c396f7
https://doi.org/10.1143/jpsj.64.2286
https://doi.org/10.1143/jpsj.64.2286
Publikováno v:
Physica B: Condensed Matter. :820-822
Charge ordering of a mixed valence system LuFe2O4 has been studied by neutron scattering technique, focusing attention on the charge frustration effect on triangular lattice. It is revealed that the system undergoes successive phase transitions follo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::859c888ad62868fb0b6291e9a5636bbd
https://doi.org/10.1016/s0921-4526(97)00728-x
https://doi.org/10.1016/s0921-4526(97)00728-x
Autor:
Yasusada Yamada, Susumu Katano, Shinichiro Nohdo, R. Kanao, Toshiya Inami, O. Hino, Naoshi Ikeda
Publikováno v:
Physica B: Condensed Matter. :433-435
We have found charge ordering in perovskite-type manganese oxides at low-carrier-doping region in neutron diffraction experiments. In La 1− x Sr x MnO 3 ( x = 0.1 and 0.15), we observed superlattice reflections at commensurate positions and the ons
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4d571efc5cfec15520dc195f6989a313
https://doi.org/10.1016/s0921-4526(97)00611-x
https://doi.org/10.1016/s0921-4526(97)00611-x
Autor:
T. Takeda, Hiroichi Kawahira, Kumiko Oguni, H. Egawa, T. Morikawa, Shigeru Moriya, Hiroyuki Nakano, Tomonori Motohashi, Kazuya Iwase, Tetsuya Kitagawa, Masaki Yoshizawa, K. Nakayama, Shinji Omori, Shinichiro Nohdo, Shoji Nohama
Publikováno v:
SPIE Proceedings.
Proximity electron lithography (PEL) using the ultra-thin tri-layer resist system has been successfully integrated in our dual-damascene Cu/low-k interconnects technology for the 90-nm node. Critical comparison between conventional ArF lithography an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a877fb413ca1bb7ff52723e181fc6e29
https://doi.org/10.1117/12.601733
https://doi.org/10.1117/12.601733
Autor:
Takashi Susa, Akira Tamura, Shinji Omori, Tetsuya Kitagawa, Kojiro Itoh, Tomonori Motohashi, Kenta Yotsui, Shinichiro Nohdo
Publikováno v:
SPIE Proceedings.
A production-compatible method for the correction of image-placement (IP) error over a 1x stencil mask as used for proximity electron lithography (PEL) has been demonstrated. The mask IP error as measured using a newly developed metrology tool was fe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::35b812d0d73669e0ff0dddbf4b2991c1
https://doi.org/10.1117/12.557821
https://doi.org/10.1117/12.557821
Autor:
Tetsuya Kitagawa, Keiko Amai, Shigeru Moriya, Shinji Omori, Kazuya Iwase, Shinichiro Nohdo, Kenta Yotsui, Yoko Watanabe, Akira Tamura, Shoji Nohama, Gaku Suzuki
Publikováno v:
SPIE Proceedings.
The performance of the LEEPL production tool is discussed from the framework of the litho-and-mask concurrent development schemes to establish the feasibility of proximity electron lithography (PEL) especially for contact and via layers in the 65-nm
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ac74d15d3ca12502a9fcefbe5ff36167
https://doi.org/10.1117/12.518816
https://doi.org/10.1117/12.518816
Autor:
Shinji Omori, Shigeru Moriya, Hiroyuki Nakano, Tomonori Motohashi, Nobuo Shimazu, Tetsuya Kitagawa, Shinichiro Nohdo
Publikováno v:
SPIE Proceedings.
The placement-error correction for low-energy electron-beam proximity-projection lithography (LEEPL) has been demonstrated to enable the overlay accuracy of 23 nm that meets the requirement for the 65-nm node. The overlay accuracy for LEEPL-ArF mix-a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9984f062b9538d5923ced2c2d093285c
https://doi.org/10.1117/12.504067
https://doi.org/10.1117/12.504067
Autor:
Hiroyuki Nakano, Shinichiro Nohdo, Kumiko Oguni, Tomonori Motohashi, Masaki Yoshizawa, Tetsuya Kitagawa, Shigeru Moriya
Publikováno v:
SPIE Proceedings.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::39b23ff17195d487b09f0d47f0a8ccf1
https://doi.org/10.1117/12.484429
https://doi.org/10.1117/12.484429