Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Shinich Igarashi"'
Autor:
Yukio Inazuki, Tasuku Senna, Hiroki Yoshikawa, Satoru Nemoto, Kazunori Seki, Karen D. Badger, Louis Kindt, Satoshi Akutagawa, Shinich Igarashi, Kazuhiro Nishikawa, Tom Faure, Takashi Mizoguchi, Richard Wistrom, Jun Kotani
Publikováno v:
SPIE Proceedings.
The lithography challenges posed by the 20 nm and 14 nm nodes continue to place strict minimum feature size requirements on photomasks. The wide spread adoption of very aggressive Optical Proximity Correction (OPC) and computational lithography techn
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::9dcf0c9dac454e9f63e34632a807994f
https://doi.org/10.1117/12.898889
https://doi.org/10.1117/12.898889
Autor:
Mitsunori Kawamura, Shinich Igarashi
Publikováno v:
Doboku Gakkai Ronbunshu. 1992:215-224
プレミックス法により作製されたガラス繊維補強コンクリートの力学的特性の材令の進行にともなう変化を明かにした. その結果, ガラス繊維補強コンクリートの力学的特性, 特にタフネ
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4084a94272c84d9446a5c2a65f8b053f
https://doi.org/10.2208/jscej.1992.451_215
https://doi.org/10.2208/jscej.1992.451_215