Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Shinchiro Kawakami"'
Autor:
David DeKraker, Michael Kocsis, Hiroie Matsumoto, Lior Huli, Benjamin L. Clark, Shan Hu, Michael Greer, Koichi Matsunaga, Masashi Enomoto, Richard A. Farrell, Jeffrey M. Lauerhaas, Andrew Grenville, Andrew Metz, Shinchiro Kawakami, Takashi Saito, David Hetzer, Anthony S. Ratkovich
Publikováno v:
Advances in Patterning Materials and Processes XXXII.
Inpria is pioneering a novel approach to EUV photoresist. Directly patternable metal oxide thin films have shown resolution better than 10nm half-pitch, with robust etch resistance, and efficient use of photons through high EUV absorbance. Inpria’s
Autor:
Doni Parnell, Etsuo Iijima, Seiji Nagahara, Tadatoshi Tomita, Shinchiro Kawakami, Mark Somervell, Makiko Dojun, Takanori Nishi, Ainhoa Romo Negreira, Jean-Luc Peyre, Takeo Nakano, Koichi Yatsuda, Kathleen Nafus, Hiroyuki Iwaki, Mariko Ozawa, Takahiro Kitano, Takashi Yamauchi, Soichiro Okada, Takumi Ishiguro, Toshikatsu Tobana, Makoto Muramatsu, Benjamen M. Rathsack
Publikováno v:
SPIE Proceedings.
Directed Self-Assembly (DSA) is one of the most promising technologies for scaling feature sizes to 16 nm and below. Both line/space and hole patterns can be created with various block copolymer morphologies, and these materials allow for molecular-l